EP 2252549 A2 20101124 - INSTALLATION AND METHOD FOR REDUCING THE CONTENT IN ELEMENTS, SUCH AS BORON, OF HALOSILANES
Title (en)
INSTALLATION AND METHOD FOR REDUCING THE CONTENT IN ELEMENTS, SUCH AS BORON, OF HALOSILANES
Title (de)
ANLAGE UND VERFAHREN ZUR VERMINDERUNG DES GEHALTES VON ELEMENTEN, WIE BOR, IN HALOGENSILANEN
Title (fr)
INSTALLATION ET PROCÉDÉ POUR RÉDUIRE LA TENEUR EN ÉLÉMENTS, TELS QUE DU BORE, D'HALOSILANES
Publication
Application
Priority
- EP 2008065902 W 20081120
- DE 102008004396 A 20080114
Abstract (en)
[origin: CN101486464A] The invention relates to an installation and a method for reducing the content in elements, such as boron, of halosilanes. The invention relates to a method for reducing the content in elements of the third main group of the periodic system, especially in boron- and aluminum-containing compounds of technically pure halosilanes for producing high-purity halosilanes, especially high-purity chlorosilanes. The invention further relates to an installation for carrying out said method. Particularly, the invention relates to a method for lowering content of third main group elements in technically pure halosilanes in order to prepare ultra-pure halosilane, which includes steps of: a) mixing the halosilanes to be purified with triphenylchloromethane to produce complex compound containing these elements; b) separating the complex compound by distillation to obtain ultra-pure halosilane.
IPC 8 full level
C01B 33/00 (2006.01)
CPC (source: EP US)
C01B 33/08 (2013.01 - EP US); C01B 33/107 (2013.01 - EP US); C01B 33/1071 (2013.01 - EP US); C01B 33/10778 (2013.01 - EP US); C01B 33/10794 (2013.01 - EP US)
Citation (search report)
See references of WO 2009089951A2
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA MK RS
DOCDB simple family (publication)
DE 102008004396 A1 20090716; BR PI0822003 A2 20150721; CA 2710796 A1 20090723; CN 101486464 A 20090722; EP 2252549 A2 20101124; JP 2011514871 A 20110512; JP 5579078 B2 20140827; KR 20100112576 A 20101019; RU 2010133877 A 20120227; RU 2502669 C2 20131227; UA 101175 C2 20130311; US 2011052474 A1 20110303; WO 2009089951 A2 20090723; WO 2009089951 A3 20110127
DOCDB simple family (application)
DE 102008004396 A 20080114; BR PI0822003 A 20081120; CA 2710796 A 20081120; CN 200910002235 A 20090113; EP 08871093 A 20081120; EP 2008065902 W 20081120; JP 2010542547 A 20081120; KR 20107015483 A 20081120; RU 2010133877 A 20081120; UA A201010055 A 20081120; US 81285708 A 20081120