EP 2253006 A1 20101124 - AN ELECTRON BEAM UNIT AND METHOD FOR ADJUSTING ELECTRON BEAMS GENERATED BY AN ELECTRON BEAM UNIT
Title (en)
AN ELECTRON BEAM UNIT AND METHOD FOR ADJUSTING ELECTRON BEAMS GENERATED BY AN ELECTRON BEAM UNIT
Title (de)
ELEKTRONENSTRAHLEINHEIT UND VERFAHREN ZUR ANPASSUNG VON DURCH EINE ELEKTRONENSTRAHLEINHEIT ERZEUGTEN ELEKTRONENSTRAHLEN
Title (fr)
UNITÉ À FAISCEAU D'ÉLECTRONS ET PROCÉDÉ POUR AJUSTER DES FAISCEAUX D'ÉLECTRONS GÉNÉRÉS PAR UNE UNITÉ À FAISCEAU D'ÉLECTRONS
Publication
Application
Priority
- EP 2009000919 W 20090210
- DE 102008009410 A 20080215
Abstract (en)
[origin: WO2009100877A1] The electron beam unit comprises an electron beam generator (1) for generating an electron beam along an electron beam axis (5), an adjusting and focusing unit (2) for adjusting and focusing the electron beam in a focus plane (6), which adjusting and focusing unit (2) is arranged on the electron beam axis (5) downstream of the electron beam generator (1), and a control (3) for controlling the adjusting and focusing unit (2). The control (3) is adapted to control the adjusting and focusing unit (2) for shifting of the focus plane (6) along the electron beam axis (5) such that the focus plane is shifted back and forth at a predetermined frequency. The orientation of the electron beam axis (5) can be adjusted with the help of the adjusting and focusing unit in such a way that the impact points displayed by the electron beam impact point display unit (4), which is arranged on the electron beam axis (5), form a circular area.
IPC 8 full level
H01J 37/147 (2006.01); H01J 37/21 (2006.01); H01J 37/315 (2006.01)
CPC (source: EP)
B23K 15/0013 (2013.01); B23K 15/0046 (2013.01); B23K 15/02 (2013.01); B23K 15/06 (2013.01); H01J 37/1471 (2013.01); H01J 37/21 (2013.01); H01J 37/315 (2013.01); H01J 2237/1501 (2013.01)
Citation (search report)
See references of WO 2009100877A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR
Designated extension state (EPC)
AL BA RS
DOCDB simple family (publication)
WO 2009100877 A1 20090820; DE 102008009410 A1 20090924; DE 102008009410 B4 20100408; EP 2253006 A1 20101124
DOCDB simple family (application)
EP 2009000919 W 20090210; DE 102008009410 A 20080215; EP 09710101 A 20090210