EP 2257971 A4 20121128 - NANOFILM PROTECTIVE AND RELEASE MATRICES
Title (en)
NANOFILM PROTECTIVE AND RELEASE MATRICES
Title (de)
NANOFILMSCHUTZ- UND ABLÖSEMATRIZEN
Title (fr)
MATRICES DE PROTECTION ET DE LIBÉRATION EN NANOFILM
Publication
Application
Priority
- US 2008013918 W 20081218
- US 1155108 P 20080118
- US 7298108 P 20080404
- US 15029808 A 20080425
- US 8008208 P 20080711
Abstract (en)
[origin: WO2009091384A1] A modified atomic plasma deposition (APD) procedure is used to produce amorphous, nonconformal thin metal film coatings on a variety of substrates. The films are porous, mesh- like lattices with imperfections such as pinholes and pores, which are useful as scaffolds for cell attachment, controlled release of bioactive agents and protective coatings.
IPC 8 full level
C23C 16/455 (2006.01); A61F 2/00 (2006.01); A61L 27/10 (2006.01); B32B 15/01 (2006.01); C23C 16/00 (2006.01); C23C 16/40 (2006.01); C23C 16/50 (2006.01); H01L 21/205 (2006.01)
CPC (source: EP)
A61F 2/00 (2013.01); A61L 27/10 (2013.01); A61L 27/105 (2013.01); A61L 27/30 (2013.01); A61L 27/54 (2013.01); A61L 27/56 (2013.01); A61L 31/082 (2013.01); A61L 31/146 (2013.01); A61L 31/16 (2013.01); C23C 16/006 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/45536 (2013.01); A61L 2400/18 (2013.01)
Citation (search report)
- [X] US 2003228727 A1 20031211 - GUERRA JOHN MICHAEL [US]
- [X] US 2004121451 A1 20040624 - MORITZ NIKO [FI], et al
- [X] NISKANEN A ET AL: "Low temperature deposition of aluminium oxide by radical enhanced atomic layer deposition", JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 152, no. 7, 10 June 2005 (2005-06-10), The Electrochemical Society, Pennington, NJ [US], pages F90 - F93, XP002518833, ISSN: 0013-4651, [retrieved on 20050610], DOI: 10.1149/1.1931471
- [XI] NISKANEN A ET AL: "Radical enhanced atomic layer deposition of titanium dioxide", CHEMICAL VAPOR DEPOSITION, vol. 13, no. 4, 4 April 2007 (2007-04-04), Wiley-VCH Verlag, Weinheim [DE], pages 152 - 157, XP001507380, ISSN: 0948-1907, DOI: 10.1002/CVDE.200606546
- See references of WO 2009091384A1
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MT NL NO PL PT RO SE SI SK TR
DOCDB simple family (publication)
WO 2009091384 A1 20090723; CN 101978472 A 20110216; CN 101978472 B 20121226; EP 2257971 A1 20101208; EP 2257971 A4 20121128
DOCDB simple family (application)
US 2008013918 W 20081218; CN 200880128157 A 20081218; EP 08871004 A 20081218