Global Patent Index - EP 2315076 A1

EP 2315076 A1 20110427 - A process and a system for orienting a template in imprint lithography

Title (en)

A process and a system for orienting a template in imprint lithography

Title (de)

Verfahren und System zur Orientierung einer Prägeform in der Prägetlithographie

Title (fr)

Procédé et système pour orienter un modèle dans la lithographie d'empreinte

Publication

EP 2315076 A1 20110427 (EN)

Application

EP 10197359 A 20001030

Priority

  • EP 00976753 A 20001030
  • US 16239299 P 19991029
  • US 69831700 A 20001027

Abstract (en)

A process for imprint lithography comprising the steps of orienting (52, 54) a lithographed template and a substrate in spaced relation to each other so that a gap is created between said template and said substrate; filling (56) said gap with UV curable liquid dispensed either before or after establishing the gap; curing (58) said UV curable liquid within said gap; and separating (60) said template and said substrate so that a pattern is transferred from said template to said substrate leaving desired features thereon. The step of orienting comprises a step (52) of performing course orientation of template and substrate so that a rough alignment of the template and substrate is achieved and then a step (54) of controlling the spacing between the template and substrate so that a relatively uniform gap is created between the two layers. It also disclosed a system for orienting a template with respect to a substrate.

IPC 8 full level

G03F 7/00 (2006.01); G03F 7/20 (2006.01); B29C 33/30 (2006.01); B29C 33/42 (2006.01); B29C 33/44 (2006.01); G03F 9/00 (2006.01); H01L 21/027 (2006.01); H02N 2/00 (2006.01)

CPC (source: EP US)

B82Y 10/00 (2013.01 - EP US); B82Y 40/00 (2013.01 - EP US); G03F 7/0002 (2013.01 - EP US); G03F 9/00 (2013.01 - EP US)

Citation (applicant)

Citation (search report)

  • [X] US 5947027 A 19990907 - BURGIN TIMOTHY P [US], et al
  • [XI] COLBURN M ET AL: "STEP AND FLASH IMPRINT LITHOGRAPHY: A NEW APPROACH TO HIGH-RESOLUTION PATTERNING", PROCEEDINGS OF SPIE, SPIE, USA, vol. 3676, 15 March 1999 (1999-03-15), pages 379 - 389, XP008011830, ISSN: 0277-786X, DOI: 10.1117/12.351155

Designated contracting state (EPC)

AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

DOCDB simple family (publication)

WO 0133300 A2 20010510; WO 0133300 A3 20020124; AU 1448801 A 20010514; EP 1240550 A2 20020918; EP 1240550 B1 20130508; EP 2315076 A1 20110427; EP 2315077 A1 20110427; HK 1049521 A1 20030516; JP 2003517727 A 20030527; JP 2011003910 A 20110106; JP 2011029641 A 20110210; JP 5603689 B2 20141008; US 2004104641 A1 20040603; US 2004149687 A1 20040805; US 2004168588 A1 20040902; US 2004169441 A1 20040902; US 2004251775 A1 20041216; US 2005089774 A1 20050428; US 2005264132 A1 20051201; US 6870301 B2 20050322; US 6873087 B1 20050329; US 6922906 B2 20050802; US 6955868 B2 20051018; US 7060402 B2 20060613; US 7098572 B2 20060829; US 7374415 B2 20080520

DOCDB simple family (application)

US 0030041 W 20001030; AU 1448801 A 20001030; EP 00976753 A 20001030; EP 10197359 A 20001030; EP 10197376 A 20001030; HK 03101591 A 20030304; JP 2001535125 A 20001030; JP 2010161891 A 20100716; JP 2010161895 A 20100716; US 11807005 A 20050429; US 61679903 A 20030710; US 61732103 A 20030710; US 69831700 A 20001027; US 77570704 A 20040210; US 78524804 A 20040224; US 78868504 A 20040227; US 80695604 A 20040323