EP 2424336 A1 20120229 - Plasma powder processing apparatus and method
Title (en)
Plasma powder processing apparatus and method
Title (de)
Vorrichtung und Verfahren zur Plasmapulververarbeitung
Title (fr)
Appareil et procédé de traitement de poudres par plasma
Publication
Application
Priority
EP 10174177 A 20100826
Abstract (en)
Plasma processing of powder particles is performed by supplying a first gas stream, containing particle material to be processed, and a second gas stream comprising a plasma carrier gas. The first gas stream is supplied from an inlet pipe into a dielectric pipe. The dielectric pipe coaxially surrounds the inlet pipe, and extends beyond a downstream end of the inlet pipe. The second gas stream is supplied into a space between the inlet pipe and the dielectric pipe and from there into the dielectric pipe beyond a downstream end of the inlet pipe. A surface dielectric barrier plasma discharge is generated along the inner surface of the dielectric pipe at least on a part of the dielectric pipe upstream of the downstream end of the inlet pipe.
IPC 8 full level
H05H 1/24 (2006.01)
CPC (source: EP US)
H05H 1/2439 (2021.05 - EP US); H05H 1/246 (2021.05 - EP)
Citation (applicant)
- US 2009293675 A1 20091203 - MUKHERJEE RAJESH [US], et al
- WO 2008014607 A1 20080207 - TEKNA PLASMA SYSTEMS INC [CA], et al
- WO 2010047593 A1 20100429 - TNO [NL], et al
- US 5620743 A 19970415 - HARTH KLAUS [DE], et al
- TATSUYA MORIA ET AL.: "Development of silica coating methods for powdered pigments with atmospheric pressure glow plasma", THIN SOLID FILMS, vol. 316, 1998, pages 89 - 92
- TAKAFUMI NAKAJIMA ET AL.: "Development of powder antifoamer by atmospheric pressure glow plasma", THIN SOLID FILMS, vol. 386, 2001, pages 208 - 212
Citation (search report)
- [XI] US 2004037756 A1 20040226 - HOUSTON EDWARD J [US], et al
- [X] WO 2007067924 A2 20070614 - STRYKER CORP [US], et al
- [A] US 2005236374 A1 20051027 - BLANKENSHIP GEORGE D [US]
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR
Designated extension state (EPC)
BA ME RS
DOCDB simple family (publication)
DOCDB simple family (application)
EP 10174177 A 20100826; NL 2011050583 W 20110826