EP 2424683 B1 20160302 - METAL SUBSTRATES HAVING A SCRATCH-PROOF AND EXTENSIBLE CORROSION PROTECTION LAYER AND METHOD FOR THE PRODUCTION THEREOF
Title (en)
METAL SUBSTRATES HAVING A SCRATCH-PROOF AND EXTENSIBLE CORROSION PROTECTION LAYER AND METHOD FOR THE PRODUCTION THEREOF
Title (de)
METALLSUBSTRATE MIT KRATZFESTER UND DEHNBARER KORROSIONSSCHUTZSCHICHT UND VERFAHREN ZU DEREN HERSTELLUNG
Title (fr)
SUBSTRATS MÉTALLIQUES AVEC COUCHE ANTICORROSION RÉSISTANTE AUX RAYURES ET EXTENSIBLE ET PROCÉDÉ POUR SA FABRICATION
Publication
Application
Priority
- EP 2010055897 W 20100430
- DE 102009002780 A 20090430
Abstract (en)
[origin: WO2010125178A1] The invention relates to a method for coating the surface of a metal substrate, comprising the following steps: A. providing the metal substrate an optionally cleaning the substrate surface to be coated, B. coating the substrate surface optionally cleaned in step A in a plasma polymerization reactor by means of plasma polymerization, - in step B, one or more organosilicon compounds and (a) no further or (b) further compounds being used as precursor(s) for the plasma, and in step B, the metal substrate being arranged in the plasma polymerization reactor in such a way that the metal substrate is connected as a cathode, characterized in that the method is conducted in such a way that the coating produced by the method has - an elongation to microcracking = 1.5%, preferably = 2.5%, - a yellow index determined according to ASTM D 1925 = 4, preferably = 3, further preferred = 2.5, and - a hardness to be measured by means of nanoindentation in the range of 2.5 to 10 GPA, preferably 3.1 to 10 GPa, further preferred 3.1 to 6 GPa, and preferably - a thermal conductivity = 5 W/m-K, preferably = 2.5 W/m-K, and/or - a dielectric strength of 10 to 100 kV/mm, preferably = 40 kV/mm, with the stipulation that the metal substrate is not a light metal substrate and with the stipulation that for the case of an elongation to microcracking of the coating = 2.2%, the hardness to be measured by means of nanoindentation is = 6 GPa.
IPC 8 full level
B05D 7/24 (2006.01); B05D 1/00 (2006.01); B05D 7/14 (2006.01)
CPC (source: EP)
B05D 1/62 (2013.01); B05D 7/14 (2013.01); B05D 2202/10 (2013.01); B05D 2202/40 (2013.01); B05D 2202/45 (2013.01)
Citation (opposition)
Opponent : BSH Hausgeräte GmbH
- WO 2009056635 A2 20090507 - FRAUNHOFER GES FORSCHUNG [DE], et al
- US 2004076837 A1 20040422 - HEIN GERALD F [US], et al
- WO 9859089 A1 19981230 - BEKAERT SA NV [BE], et al
- DE 102006032568 A1 20080117 - STEIN RALF [DE]
- EP 0752483 A1 19970108 - ANTEC ANGEWANDTE NEUE TECHNOLO [DE]
- DE 19824364 A1 19991202 - BOSCH GMBH ROBERT [DE]
- WO 2004063422 A2 20040729 - APPLIED MATERIALS INC [US], et al
- WO 03002269 A2 20030109 - FRAUNHOFER GES FORSCHUNG [DE], et al
- WO 9738850 A1 19971023 - MONSANTO CO [US]
- D. HEGEMANN ET AL.: "Deposition rate and three-dimensional uniformity of RF plasma deposited SiO"x films", SURFACE AND COATINGS TECHNOLOGY, vol. 142-144, 2001, pages 849 - 855, XP027329275
- B. JACOBY ET AL., VAKUUM IN FORSCHUNG UND PRAXIS, vol. 18, no. 4, 2006, pages 12 - 18, XP055330192
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR
DOCDB simple family (publication)
WO 2010125178 A1 20101104; DE 102009002780 A1 20101111; EP 2424683 A1 20120307; EP 2424683 B1 20160302; EP 2424683 B2 20211027
DOCDB simple family (application)
EP 2010055897 W 20100430; DE 102009002780 A 20090430; EP 10718958 A 20100430