Global Patent Index - EP 2441859 A1

EP 2441859 A1 20120418 - PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Title (en)

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Title (de)

VORRICHTUNG ZUR PLASMAVERARBEITUNG UND VERFAHREN ZUR PLASMAVERARBEITUNG

Title (fr)

APPAREIL DE TRAITEMENT AU PLASMA ET PROCÉDÉ DE TRAITEMENT AU PLASMA

Publication

EP 2441859 A1 20120418 (EN)

Application

EP 10786056 A 20100524

Priority

  • JP 2010058734 W 20100524
  • JP 2009139795 A 20090611

Abstract (en)

Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber (11), the inner cylinder (15) composed of a surface-alumited aluminum, disposes a substrate in a plasma diffusion region, and performs plasma processing. A plurality of protruding portions (15a) in point-contact with the vacuum chamber (11) are provided on the lower end portion of the inner cylinder (15), the alumite film (16) on the leading end portion (15b) of each of the protruding portion (15a) is removed, and the inner cylinder and the vacuum chamber (11) are electrically connected to each other.

IPC 8 full level

C23C 16/44 (2006.01); H01L 21/205 (2006.01)

CPC (source: EP KR US)

C23C 16/4404 (2013.01 - EP KR US); C23C 16/50 (2013.01 - EP KR US); H01J 37/32467 (2013.01 - EP KR US); H01J 37/32504 (2013.01 - EP KR US); H01J 37/32577 (2013.01 - EP US); Y10S 156/916 (2013.01 - EP US)

Citation (search report)

See references of WO 2010143525A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR

DOCDB simple family (publication)

EP 2441859 A1 20120418; JP 2010285650 A 20101224; JP 5351625 B2 20131127; KR 101421331 B1 20140718; KR 20120014201 A 20120216; TW 201130389 A 20110901; TW I419616 B 20131211; US 2012125891 A1 20120524; US 8960124 B2 20150224; WO 2010143525 A1 20101216

DOCDB simple family (application)

EP 10786056 A 20100524; JP 2009139795 A 20090611; JP 2010058734 W 20100524; KR 20117029464 A 20100524; TW 99117028 A 20100527; US 201013322192 A 20100524