EP 2500777 A1 20120919 - Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
Title (en)
Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less
Title (de)
Verfahren zur Herstellung integrierter Schaltvorrichtungen, optischer Vorrichtungen, Mikromaschinen und mechanischer Präzisionsgeräte mit strukturierten Materialschichten von 50 nm oder weniger
Title (fr)
Procédé de fabrication de dispositifs de circuit intégré, dispositifs optiques, micromachines et de dispositifs de précision mécanique dotés de couches de matériau avec des motifs de dimensions inférieures ou égales à 50 nm
Publication
Application
Priority
EP 11158833 A 20110318
Abstract (en)
A method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices, the said method comprising the steps of (1) providing a substrate having patterned material layers having line-space dimensions of 50 nm and less and aspect ratios of >2; (2) providing the surface of the patterned material layers with a positive or a negative electrical charge by contacting the substrate at least once with an aqueous, fluorine-free solution S containing at least one fluorine-free cationic surfactant A having at least one cationic or potentially cationic group, at least one fluorine-free anionic surfactant A having at least one anionic or potentially anionic group, or at least one fluorine-free amphoteric surfactant A; and (3) removing the aqueous, fluorine-free solution S from the contact with the substrate.
IPC 8 full level
CPC (source: EP)
G03F 7/2041 (2013.01); G03F 7/40 (2013.01)
Citation (applicant)
- US 2008280230 A1 20081113 - CHANG CHING-YU [TW], et al
- US 2008299487 A1 20081204 - CHANG CHING-YU [TW]
- WO 2008003443 A1 20080110 - MERCK PATENT GMBH [DE], et al
- WO 2008003445 A1 20080110 - MERCK PATENT GMBH [DE], et al
- WO 2008003446 A2 20080110 - MERCK PATENT GMBH [DE], et al
- WO 2009149807 A1 20091217 - MERCK PATENT GMBH [DE], et al
- US 2009264525 A1 20091022 - HIERSE WOLFGANG [DE], et al
Citation (search report)
- [I] EP 1553454 A2 20050713 - MATSUSHITA ELECTRIC IND CO LTD [JP]
- [I] JP 2007258638 A 20071004 - SONY CORP
- [I] KWANGJOO LEE: "Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants", PROCEEDINGS OF SPIE, vol. 5753, 1 January 2005 (2005-01-01), pages 537 - 553, XP055002751, ISSN: 0277-786X, DOI: 10.1117/12.606105
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
DOCDB simple family (application)
EP 11158833 A 20110318