EP 2510538 A4 20140326 - REMOVAL OF MASKING MATERIAL
Title (en)
REMOVAL OF MASKING MATERIAL
Title (de)
ENTFERNUNG EINES MASKIERUNGSMATERIALS
Title (fr)
ÉLIMINATION D'UNE MATIÈRE DE MASQUAGE
Publication
Application
Priority
- US 63601509 A 20091211
- US 35624210 P 20100618
- US 2010059800 W 20101210
Abstract (en)
[origin: WO2011072188A2] Methods for removing a masking material, for example, a photoresist, and electronic devices formed by removing a masking material are presented. For example, a method for removing a masking material includes contacting the masking material with a solution comprising cerium and at least one additional oxidant. The cerium may be comprised in a salt. The salt may be cerium ammonium nitrate. The at least one additional oxidant may be a manganese, ruthenium, and/or osmium-containing compound.
IPC 8 full level
H01L 21/311 (2006.01); G03F 7/42 (2006.01)
CPC (source: EP KR)
G03F 7/423 (2013.01 - EP); H01L 21/3063 (2013.01 - KR); H01L 21/31133 (2013.01 - EP)
Citation (search report)
- [I] US 2008283090 A1 20081120 - DEKRAKER DAVID [US], et al
- [X] WO 2006113621 A2 20061026 - ADVANCED TECH MATERIALS [US], et al
- See references of WO 2011072188A2
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2011072188 A2 20110616; WO 2011072188 A3 20110915; CN 103119694 A 20130522; EP 2510538 A2 20121017; EP 2510538 A4 20140326; JP 2013513824 A 20130422; KR 20120108984 A 20121005; SG 181642 A1 20120730; TW 201140254 A 20111116
DOCDB simple family (application)
US 2010059800 W 20101210; CN 201080062933 A 20101210; EP 10836729 A 20101210; JP 2012543300 A 20101210; KR 20127017769 A 20101210; SG 2012042941 A 20101210; TW 99143206 A 20101210