EP 2511766 A1 20121017 - Topcoat compositions for photoresist and immersion photolithography process using them
Title (en)
Topcoat compositions for photoresist and immersion photolithography process using them
Title (de)
Deckschicht Zusammensetzungen für Photoresist und Immersionsfotolithografisches Verfahren unter deren Verwendung
Title (fr)
Compositions de couche de surface pour photorésist et procédé de photolithographie à immersion les utilisant
Publication
Application
Priority
US 201161475661 P 20110414
Abstract (en)
Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
IPC 8 full level
G03F 7/20 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/11 (2006.01)
CPC (source: EP KR US)
G03F 7/004 (2013.01 - KR); G03F 7/0045 (2013.01 - KR); G03F 7/0046 (2013.01 - EP KR US); G03F 7/11 (2013.01 - EP KR US); G03F 7/2041 (2013.01 - EP KR US)
Citation (applicant)
- EP 0829766 A2 19980318 - SHIPLEY CO LLC [US]
- EP 0783136 A2 19970709 - SHIPLEY CO LLC [US]
- EP 0930542 A1 19990721 - SHIPLEY CO LLC [US]
- US 6692888 B1 20040217 - BARCLAY GEORGE G [US], et al
- US 6680159 B2 20040120 - BARCLAY GEORGE G [US], et al
- EP 0164248 B1 19911009
- EP 0232972 B1 19930908
- US 5128232 A 19920707 - THACKERAY JAMES [US], et al
- WO 03077029 A1 20030918 - SHIPLEY CO LLC [US]
- DANIEL P. SANDERS ET AL.: "Self segregating Materials for Immersion Lithography", ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXV, PROCEEDINGS OF THE SPIE, vol. 6923, 2008, pages 692309 - 1,692309-12
Citation (search report)
- [X] EP 2204392 A1 20100707 - ROHM & HAAS ELECT MAT [US]
- [X] US 2008311506 A1 20081218 - ALLEN ROBERT D [US], et al
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
EP 2511766 A1 20121017; EP 2511766 B1 20130731; CN 102746760 A 20121024; CN 102746760 B 20160518; IL 219152 A0 20120731; IL 219152 B 20180131; JP 2012237979 A 20121206; JP 6034588 B2 20161130; KR 101907483 B1 20181012; KR 20120117699 A 20121024; TW 201250382 A 20121216; TW I477903 B 20150321; US 2012264053 A1 20121018; US 9122159 B2 20150901
DOCDB simple family (application)
EP 12163989 A 20120412; CN 201210189046 A 20120416; IL 21915212 A 20120415; JP 2012091469 A 20120413; KR 20120039296 A 20120416; TW 101113157 A 20120413; US 201213445442 A 20120412