EP 2558612 A1 20130220 - A METHOD AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE MATERIAL IN PHOTOVOLTAIC APPLICATIONS
Title (en)
A METHOD AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE MATERIAL IN PHOTOVOLTAIC APPLICATIONS
Title (de)
VERFAHREN UND VORRICHTUNG ZUR ABSCHEIDUNG EINES MIKROKRISTALLINEN MATERIALS BEI PV-ANWENDUNGEN
Title (fr)
PROCÉDÉ ET APPAREIL POUR DÉPOSER UNE MATIÈRE MICROCRISTALLINE DANS DES APPLICATIONS PHOTOVOLTAÏQUES
Publication
Application
Priority
- US 32490910 P 20100416
- CH 2011000080 W 20110414
Abstract (en)
[origin: WO2011127619A1] A deposition method and system for producing a photovoltaic cell is provided. The method includes maintaining a sub-atmospheric pressure within a reaction chamber during at least a portion of the deposition of the semiconductor material. The distance D separating the first and second electrodes is expressed in mm, and is greater than or equal to about 10 mm but less than or equal to about 30 mm. A concentration of the semiconductor-containing gas in the process gas of at least fifty (50%) percent by volume is established during at least a portion of the deposition of the semiconductor material.
IPC 8 full level
C23C 16/24 (2006.01); C23C 16/455 (2006.01)
CPC (source: CN EP KR)
C23C 16/24 (2013.01 - CN EP KR); C23C 16/455 (2013.01 - KR); C23C 16/45557 (2013.01 - CN EP)
Citation (search report)
See references of WO 2011127619A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2011127619 A1 20111020; CN 102834546 A 20121219; CN 102834546 B 20160330; CN 105887040 A 20160824; EP 2558612 A1 20130220; JP 2013529374 A 20130718; KR 20130093490 A 20130822
DOCDB simple family (application)
CH 2011000080 W 20110414; CN 201180019365 A 20110414; CN 201610101963 A 20110414; EP 11716460 A 20110414; JP 2013504086 A 20110414; KR 20127029314 A 20110414