EP 2562599 A2 20130227 - Process for producing a photomask on a photopolymeric surface
Title (en)
Process for producing a photomask on a photopolymeric surface
Title (de)
Verfahren zur Herstellung einer Fotomaske auf einer Fotopolymeroberfläche
Title (fr)
Procédé de production d'un photomasque sur une surface photopolymérique
Publication
Application
Priority
- EP 10704601 A 20100127
- US 20210909 P 20090129
Abstract (en)
A process is provided for printing a high resolution pattern on a photopolymeric surface.
IPC 8 full level
G03F 1/00 (2012.01); B41C 1/10 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP US)
G03F 1/50 (2013.01 - US); G03F 7/2018 (2013.01 - EP US)
Citation (applicant)
- US 6833008 B2 20041221 - NITZAN BOAZ [IL], et al
- US 5621448 A 19970415 - OELBRANDT LEO [BE], et al
- US 5621449 A 19970415 - LEENDERS LUC [BE], et al
- US 6440896 B1 20020827 - SZAJEWSKI RICHARD P [US], et al
- US 6197722 B1 20010306 - IRVING LYN M [US], et al
- WO 9963406 A1 19991209 - UNIV DUNDEE [GB], et al
- WO 0109679 A1 20010208 - CREOSCITEX CORP LTD [IL], et al
- US 6342096 B1 20020129 - KURABAYASHI YUTAKA [JP]
- US 6341855 B1 20020129 - KURABAYASHI YUTAKA [JP]
- US 6059404 A 20000509 - JAEGER C WAYNE [US], et al
Designated contracting state (EPC)
AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK SM TR
DOCDB simple family (publication)
WO 2010086850 A2 20100805; WO 2010086850 A3 20100916; CA 2787249 A1 20100805; CA 2787249 C 20170912; CN 102365584 A 20120229; CN 102365584 B 20140730; EP 2391924 A2 20111207; EP 2391924 B1 20130724; EP 2562599 A2 20130227; EP 2562599 A3 20130612; EP 2562599 B1 20141210; US 2012045583 A1 20120223; US 9513551 B2 20161206
DOCDB simple family (application)
IL 2010000068 W 20100127; CA 2787249 A 20100127; CN 201080013570 A 20100127; EP 10704601 A 20100127; EP 12193114 A 20100127; US 201013146749 A 20100127