Global Patent Index - EP 2572185 A2

EP 2572185 A2 20130327 - METHOD FOR DEPOSITING SENSOR MATERIAL ON A SUBSTRATE

Title (en)

METHOD FOR DEPOSITING SENSOR MATERIAL ON A SUBSTRATE

Title (de)

VERFAHREN ZUR ABLAGERUNG EINES SENSORMATERIALS AUF EINEM SUBSTRAT

Title (fr)

PROCÉDÉ DE DÉPÔT D'UN MATÉRIAU CONSTITUANT UN CAPTEUR SUR UN SUBSTRAT

Publication

EP 2572185 A2 20130327 (EN)

Application

EP 11720468 A 20110518

Priority

  • DK PA201070205 A 20100518
  • EP 2011058031 W 20110518

Abstract (en)

[origin: WO2011144652A2] A method for manufacturing a sensor, the method comprising: providing at least a sensor deposition area of a surface of a substrate with a predetermined microstructure; depositing a layer of sensor material on the microstructured sensor deposition area.

IPC 8 full level

G01N 21/77 (2006.01)

CPC (source: EP)

G01N 21/77 (2013.01); G01N 21/7743 (2013.01); G01N 2021/0325 (2013.01); G01N 2021/7786 (2013.01); G01N 2021/7796 (2013.01)

Citation (search report)

See references of WO 2011144652A2

Citation (examination)

  • ELENA MARTINES ET AL: "superhydrophobicity and superhydrophilicity of regular nanopatterns", NANO LETTERS, AMERICAN CHEMICAL SOCIETY, vol. 5, no. 10, 1 January 2005 (2005-01-01), pages 2097 - 2103, XP002454274, ISSN: 1530-6984, DOI: 10.1021/NL051435T
  • J-G FAN ET AL: "Water contact angles of vertically aligned Si nanorod arrays; Water contact angles of vertically aligned Si nanorod arrays", NANOTECHNOLOGY, IOP, BRISTOL, GB, vol. 15, no. 5, 1 May 2004 (2004-05-01), pages 501 - 504, XP020067932, ISSN: 0957-4484, DOI: 10.1088/0957-4484/15/5/017

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

WO 2011144652 A2 20111124; WO 2011144652 A3 20120112; EP 2572185 A2 20130327

DOCDB simple family (application)

EP 2011058031 W 20110518; EP 11720468 A 20110518