EP 2583141 B1 20210414 - ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY AND PROJECTION EXPOSURE SYSTEM WITH AN ILLUMINATION OPTICAL SYSTEM OF THIS TYPE
Title (en)
ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY AND PROJECTION EXPOSURE SYSTEM WITH AN ILLUMINATION OPTICAL SYSTEM OF THIS TYPE
Title (de)
OPTISCHES BELEUCHTUNGSSYSTEM FÜR MIKROLITHOGRAFIE UND PROJEKTIONSBELEICHTUNGSSYSTEM MIT EINEM DERARTIGEN OPTISCHEN BELEUCHTUNGSSYSTEM
Title (fr)
SYSTÈME D'ÉCLAIRAGE OPTIQUE POUR LA MICROLITHOGRAPHIE ET SYSTÈME D'EXPOSITION PAR PROJECTION AYANT UN SYSTÈME D'ÉCLAIRAGE OPTIQUE DE CE TYPE
Publication
Application
Priority
- US 35477210 P 20100615
- DE 102010030089 A 20100615
- EP 2011059427 W 20110608
Abstract (en)
[origin: WO2011157601A2] An illumination optical system (7) for microlithography is used to guide illumination light (8) from a primary light source (6) to an object field (3). A mirror array (10) of the illumination optical system (7) has a plurality of individual mirrors (11), which can be tilted independently of one another by actuators and are connected to associated tilting actuators (12).A controller (14) is used to activate the actuators (12).A raster module (19) of the illumination optical system (7) has a plurality of raster elements (28, 30) to produce a spatially distributed arrangement of secondary light sources. The raster module (19) is arranged in the region of a plane (20) of the illumination optical system (7), in which an emergent angle (ARx ), at which an illumination light part bundle (15) leaves one of the raster elements (30), is precisely allocated to a location region in the object field (3), on which the illumination light part bundle (15) impinges on the object field (3).The controller (14) is configured in such a way that a specification of a tilting angle for each individual mirror (11) is allocated to a predetermined desired course of illumination angle intensity distributions, with which object field points distributed over the object field (3) are impinged upon. The raster module (19), depending on the respective actual angle of incidence, produces another intensity course in the object field (3). The result is an illumination optical system, in which an illumination intensity over the object field can be influenced in a targeted manner with respect to the total illumination intensity and/or with respect to the intensity contributions from different illumination directions.
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP US)
G03F 7/70075 (2013.01 - EP US); G03F 7/70083 (2013.01 - EP US); G03F 7/70091 (2013.01 - US); G03F 7/70116 (2013.01 - EP US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
DE 102010030089 A1 20111215; EP 2583141 A2 20130424; EP 2583141 B1 20210414; JP 2013530534 A 20130725; JP 5753260 B2 20150722; TW 201219987 A 20120516; TW I539240 B 20160621; US 2013077076 A1 20130328; US 9933704 B2 20180403; WO 2011157601 A2 20111222; WO 2011157601 A3 20120223
DOCDB simple family (application)
DE 102010030089 A 20100615; EP 11723967 A 20110608; EP 2011059427 W 20110608; JP 2013514638 A 20110608; TW 100120852 A 20110615; US 201213681938 A 20121120