EP 2592911 B1 20170510 - PLASMA-GENERATING APPARATUS
Title (en)
PLASMA-GENERATING APPARATUS
Title (de)
PLASMAERZEUGUNGSVORRICHTUNG
Title (fr)
APPAREIL DE GÉNÉRATION DE PLASMA
Publication
Application
Priority
- JP 2010155293 A 20100707
- JP 2011065252 W 20110704
Abstract (en)
[origin: EP2592911A1] The plasma generation device 30 is provided with a high frequency generation device 37 that generates a high frequency wave, and a high frequency radiator 15 that radiates the high frequency wave outputted from the high frequency generation device 37 to a target space 10, and generates plasma by supplying energy of the high frequency wave to the target space 10. In the plasma generation device 30, the high frequency generation device 37 is provided with an oscillator 41 that oscillates a high frequency wave, and an amplifier 42 that amplifies and outputs the high frequency wave oscillated by the oscillator 41 to the high frequency radiator 15. In the high frequency generating device 37the amplifier 42 alone is integrated with the high frequency radiator 15, from among the oscillator 41 and the amplifier 42.
IPC 8 full level
H05H 1/24 (2006.01); F02P 3/01 (2006.01); F02P 15/00 (2006.01); F02P 23/04 (2006.01); H01F 38/12 (2006.01); H01T 13/40 (2006.01); H05H 1/46 (2006.01); H05H 1/52 (2006.01)
CPC (source: EP US)
F02P 3/01 (2013.01 - EP US); F02P 23/04 (2013.01 - EP US); H05H 1/46 (2013.01 - EP US); H05H 1/466 (2021.05 - EP); H05H 1/50 (2013.01 - US); H05H 1/466 (2021.05 - US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
EP 2592911 A1 20130515; EP 2592911 A4 20140917; EP 2592911 B1 20170510; JP WO2012005201 A1 20130902; US 2013119865 A1 20130516; US 8873216 B2 20141028; WO 2012005201 A1 20120112
DOCDB simple family (application)
EP 11803535 A 20110704; JP 2011065252 W 20110704; JP 2012523851 A 20110704; US 201313735441 A 20130107