Global Patent Index - EP 2633366 A1

EP 2633366 A1 20130904 - SYSTEM FOR LASER DIRECT WRITING OF MESA STRUCTURES HAVING NEGATIVELY SLOPED SIDEWALLS

Title (en)

SYSTEM FOR LASER DIRECT WRITING OF MESA STRUCTURES HAVING NEGATIVELY SLOPED SIDEWALLS

Title (de)

SYSTEM FÜR DIREKTES LASERBESCHRIFTEN VON MESASTRUKTUREN MIT NEGATIV GENEIGTEN SEITENWÄNDEN

Title (fr)

BANC D'ECRITURE LASER DIRECTE DE STRUCTURES MESA COMPORTANT DES FLANCS A PENTES NEGATIVES

Publication

EP 2633366 A1 20130904 (FR)

Application

EP 11770461 A 20111018

Priority

  • FR 1058832 A 20101027
  • EP 2011068168 W 20111018

Abstract (en)

[origin: WO2012055725A1] The general field of the invention is that of photolithography systems intended for producing electronic components, using the lift-off technique, on a flat substrate (1) comprising one or more flat photosensitive layers. The system according to the invention is a laser direct-write system. It comprises optical or mechanical means arranged so that the useful part of the optical beam (F) is inclined in the plane of the photosensitive layers in order to create re-entrant profiles in said layers, the useful part of the optical beam being the part of the optical beam that actually contributes to create said profiles. In a preferred embodiment of the invention, the system comprises means (50) for partially blocking the optical beam, said means being located in the vicinity of the focusing optics (23).

IPC 8 full level

G03F 7/20 (2006.01); H01L 21/027 (2006.01)

CPC (source: EP KR US)

B23K 26/02 (2013.01 - KR US); B41J 2/442 (2013.01 - US); B41J 2/465 (2013.01 - US); G03F 7/2053 (2013.01 - KR US); G03F 7/70383 (2013.01 - EP KR US); H01L 21/0272 (2013.01 - EP KR US); H01L 21/0274 (2013.01 - KR); H01L 21/0275 (2013.01 - EP KR US); G03F 7/20 (2013.01 - US)

Citation (search report)

See references of WO 2012055725A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

WO 2012055725 A1 20120503; CN 103201681 A 20130710; EP 2633366 A1 20130904; FR 2966940 A1 20120504; FR 2966940 B1 20130816; JP 2014500523 A 20140109; KR 20130132782 A 20131205; US 2013213944 A1 20130822

DOCDB simple family (application)

EP 2011068168 W 20111018; CN 201180052361 A 20111018; EP 11770461 A 20111018; FR 1058832 A 20101027; JP 2013535359 A 20111018; KR 20137010863 A 20111018; US 201113882194 A 20111018