EP 2646602 B1 20160427 - METHOD OF MANUFACTURING AN X-RAY DIFFRACTION GRATING MICROSTRUCTURE FOR IMAGING APPARATUS
Title (en)
METHOD OF MANUFACTURING AN X-RAY DIFFRACTION GRATING MICROSTRUCTURE FOR IMAGING APPARATUS
Title (de)
VERFAHREN ZUR HERSTELLUNG EINER MIKROSTRUKTUR EINES RÖNTGEN-DURCHSTRAHLUNGSGITTERS FÜR EIN BILDAUFNAHMEGERÄT
Title (fr)
MÉTHODE DE MANUFACTURE D'UNE MICROSTRUCTURE EN RÉSEAU DE DIFFRACTION DE RAYONS X POUR UN APPAREIL D'IMAGERIE
Publication
Application
Priority
- JP 2010265093 A 20101129
- JP 2011063989 W 20110610
Abstract (en)
[origin: WO2012073545A1] A microstructure manufacturing method includes forming a first insulating film on an Si substrate, exposing an Si surface by removing a part of the first insulating film, forming a recessed portion by etching the Si substrate from the exposed Si surface, forming a second insulating film on a sidewall and a bottom of the recessed portion, forming an Si exposed surface by removing at least a part of the second insulating film formed on the bottom of the recessed portion, and filling the recessed portion with a metal from the Si exposed surface by electrolytic plating.
IPC 8 full level
C25D 5/02 (2006.01); C25D 7/00 (2006.01); C25D 7/12 (2006.01); G21K 1/06 (2006.01); H01L 21/768 (2006.01)
CPC (source: EP)
C25D 5/022 (2013.01); C25D 7/123 (2013.01); G21K 1/02 (2013.01); G21K 2207/005 (2013.01)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2012073545 A1 20120607; CN 102812164 A 20121205; EP 2646602 A1 20131009; EP 2646602 B1 20160427
DOCDB simple family (application)
JP 2011063989 W 20110610; CN 201180014855 A 20110610; EP 11731520 A 20110610