EP 2676300 A4 20170503 - METHODS OF FORMING SEMICONDUCTOR FILMS INCLUDING I2-II-IV-VI4 AND I2-(II,IV)-IV-VI4 SEMICONDUCTOR FILMS AND ELECTRONIC DEVICES INCLUDING THE SEMICONDUCTOR FILMS
Title (en)
METHODS OF FORMING SEMICONDUCTOR FILMS INCLUDING I2-II-IV-VI4 AND I2-(II,IV)-IV-VI4 SEMICONDUCTOR FILMS AND ELECTRONIC DEVICES INCLUDING THE SEMICONDUCTOR FILMS
Title (de)
VERFAHREN ZUR HERSTELLUNG VON HALBLEITERSCHICHTEN MIT I2-II-IV-VI4 UND I2-(II, IV) VI4-IV-HALBLEITERSCHICHTEN UND ELEKTRONISCHEN BAUELEMENTEN EINSCHLIESSLICH DER HALBLEITERSCHICHTEN
Title (fr)
PROCÉDÉS DE FORMATION DE FILMS SEMICONDUCTEURS COMPRENANT DES FILMS SEMICONDUCTEURS I2-II-IV-VI4 ET I2-(II,IV)-IV-VI4 ET DISPOSITIFS ÉLECTRONIQUES COMPRENANT
Publication
Application
Priority
- US 201161444398 P 20110218
- US 2012025706 W 20120217
Abstract (en)
[origin: WO2012112927A2] Embodiments of the present invention generally include methods for forming semiconductor films having nominal I2-II-IV-VI4 stoichiometry, such as CZTS or CZTSSe, using a solution of including sources of the I, II, IV, and VI elements in a liquid solvent. Precursors may be mixed in the solvent to form the solution. Metal halide salts may be used as precursors in some examples. The solution may be coated onto a substrate and annealed to yield the semiconductor film. In some examples, the source of the 'I' and 'IV' elements may contain the elements in a +2 oxidation state, while the semiconductor film may contain the 'I' element in a +1 oxidation state and the 'IV' element in a +4 oxidation state. Examples may be used to provide I2-(II,IV)-IV-VI4 films.
IPC 8 full level
H01L 21/368 (2006.01); H01L 31/032 (2006.01); H01L 31/072 (2012.01); H01L 31/18 (2006.01)
CPC (source: CN EP US)
H01L 21/02422 (2013.01 - CN EP US); H01L 21/02491 (2013.01 - CN EP US); H01L 21/02557 (2013.01 - CN EP US); H01L 21/0256 (2013.01 - CN EP US); H01L 21/02568 (2013.01 - CN EP US); H01L 21/02628 (2013.01 - CN EP US); H01L 31/0326 (2013.01 - CN EP US); H01L 31/072 (2013.01 - CN EP US); H01L 31/18 (2013.01 - US); Y02E 10/50 (2013.01 - US); Y02E 10/541 (2013.01 - EP); Y02P 70/50 (2015.11 - EP)
Citation (search report)
- [XI] WO 2010138982 A1 20101209 - ISOVOLTAIC GMBH [AT], et al
- [XI] WO 2010094779 A1 20100826 - CARL VON OSSIETZKY UNI OLDENBU [DE], et al
- [XI] WO 2010138636 A2 20101202 - PURDUE RESEARCH FOUNDATION [US], et al
- [A] EP 2234168 A1 20100929 - SHANGHAI INST CERAMICS [CN]
- [XI] PRABHAKAR T ET AL: "Ultrasonic spray pyrolysis of CZTS solar cell absorber layers and characterization studies", 35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 20-25 JUNE 2010, HONOLULU, HI, USA, IEEE, PISCATAWAY, NJ, USA, 20 June 2010 (2010-06-20), pages 1964 - 1969, XP031786157, ISBN: 978-1-4244-5890-5
- [XI] KAMOUN ET AL: "Fabrication and characterization of Cu"2ZnSnS"4 thin films deposited by spray pyrolysis technique", THIN SOLID FILMS, ELSEVIER, AMSTERDAM, NL, vol. 515, no. 15, 27 April 2007 (2007-04-27), pages 5949 - 5952, XP022212799, ISSN: 0040-6090, DOI: 10.1016/J.TSF.2006.12.144
- See references of WO 2012112927A2
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2012112927 A2 20120823; WO 2012112927 A3 20121108; CN 103650155 A 20140319; CN 103650155 B 20161012; EP 2676300 A2 20131225; EP 2676300 A4 20170503; JP 2014506018 A 20140306; JP 5774727 B2 20150909; US 2014220728 A1 20140807
DOCDB simple family (application)
US 2012025706 W 20120217; CN 201280015103 A 20120217; EP 12747692 A 20120217; JP 2013554649 A 20120217; US 201214000183 A 20120217