EP 2682815 A4 20150429 - LITHOGRAPHIC PRINTING MASTER PLATE AND METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE
Title (en)
LITHOGRAPHIC PRINTING MASTER PLATE AND METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE
Title (de)
LITHOGRAFISCHE ORIGINALDRUCKPLATTE UND VERFAHREN ZUR HERSTELLUNG EINER LITHOGRAFISCHEN FLACHDRUCKPLATTE
Title (fr)
PLAQUE MAÎTRESSE D'IMPRESSION LITHOGRAPHIQUE ET PROCÉDÉ DE FABRICATION DE PLAQUE MAÎTRESSE D'IMPRESSION LITHOGRAPHIQUE
Publication
Application
Priority
- JP 2011042496 A 20110228
- JP 2011042497 A 20110228
- JP 2012013295 A 20120125
- JP 2012054056 W 20120221
Abstract (en)
[origin: US2013344440A1] Provided is lithographic printing plates and processes for preparing the lithographic printing plates having excellent printing durability, staining resistance and staining resistance over time. A lithographic printing plate precursor comprising: a substrate; a photosensitive layer provided on the substrate; and an extra layer optionally provided between the substrate and the photosensitive layer; wherein the photosensitive layer or the extra layer adjacent to the substrate contains (A) a copolymer; and wherein the copolymer (A) comprises: (a1) a repeating unit having a structure represented by formula (a1-1) below in a side chain, and (a2) a repeating unit having at least one of the structures represented by formulae (a2-1) to (a2-6) below in a side chain. L1 represents a single bond, a divalent aromatic group containing 6 to 14 carbon atoms, -C(=O)-O-, or -C(-0)=NR2- (wherein R2 represents a hydrogen atom, alkyl or aryl). Z1 represents methylene, ethylene, propylene, butylene, pentylene, hexylene, heptylene, octylene, cyclohexane-1,4-diyl, 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, 1,2-naphthalene, 1,5-naphthalene and a linking group composed of two or more of these divalent linking groups linked through -O- or -S-, wherein a hydrogen atoms in these divalent linking groups may be replaced by substituents. R1 represents a hydrogen atom, alkyl, aryl, heterocyclyl, sulfo, alkylsulfonyl and arylsulfonyl. R21, R22 and R23 each independently represent a hydrogen atom, halogen atom or C1-8 alkyl.
IPC 8 full level
G03F 7/11 (2006.01); C08F 220/60 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/027 (2006.01); G03F 7/038 (2006.01); G03F 7/085 (2006.01); G03F 7/09 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01)
CPC (source: EP US)
G03F 7/00 (2013.01 - US); G03F 7/004 (2013.01 - US); G03F 7/027 (2013.01 - EP US); G03F 7/033 (2013.01 - EP US); G03F 7/038 (2013.01 - US); G03F 7/0388 (2013.01 - EP US); G03F 7/085 (2013.01 - EP US); G03F 7/09 (2013.01 - US); G03F 7/092 (2013.01 - EP US); G03F 7/11 (2013.01 - EP US); G03F 7/30 (2013.01 - US); G03F 7/32 (2013.01 - EP US); G03F 7/322 (2013.01 - EP US); C08F 220/603 (2020.02 - EP US); C08F 220/606 (2020.02 - EP US); G03F 7/3042 (2013.01 - EP US)
Citation (search report)
- [XY] JP 2009244778 A 20091022 - FUJIFILM CORP
- [Y] EP 2226681 A1 20100908 - FUJIFILM CORP [JP]
- See references of WO 2012117882A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
US 2013344440 A1 20131226; US 8895224 B2 20141125; CN 103415808 A 20131127; CN 103415808 B 20170623; EP 2682815 A1 20140108; EP 2682815 A4 20150429; EP 3001249 A2 20160330; EP 3001249 A3 20160504; EP 3001249 B1 20191225; US 2015044612 A1 20150212; US 9690195 B2 20170627; WO 2012117882 A1 20120907
DOCDB simple family (application)
US 201313975978 A 20130826; CN 201280010671 A 20120221; EP 12752424 A 20120221; EP 15191630 A 20120221; JP 2012054056 W 20120221; US 201414519542 A 20141021