EP 2695015 A1 20140212 - EXPOSURE DEVICE FOR THE STRUCTURED EXPOSURE OF A SURFACE
Title (en)
EXPOSURE DEVICE FOR THE STRUCTURED EXPOSURE OF A SURFACE
Title (de)
BELICHTUNGSEINRICHTUNG ZUR STRUKTURIERTEN BELICHTUNG EINER FLÄCHE
Title (fr)
DISPOSITIF D'ÉCLAIRAGE POUR L'ÉCLAIRAGE STRUCTURÉ D'UNE SURFACE
Publication
Application
Priority
- DE 102011001785 A 20110404
- DE 2012100056 W 20120308
Abstract (en)
[origin: WO2012136199A1] The invention relates to an exposure device (14) for the structured exposure of a wafer, comprising at least one exposure arrangement (13) with which a beam (2) that is separated into two sub-beams (2.1, 2.2) is modulated via two micromirror arrays (5.1; 5.2) in order to increase the throughput speed during the exposure of wafers.
IPC 8 full level
G02B 26/08 (2006.01); G03F 7/20 (2006.01)
CPC (source: EP KR US)
G02B 3/0056 (2013.01 - EP KR US); G02B 26/0841 (2013.01 - EP KR US); G03F 7/7005 (2013.01 - EP KR US); G03F 7/70058 (2013.01 - KR); G03F 7/70208 (2013.01 - EP KR US); G03F 7/70291 (2013.01 - EP KR US); H01L 21/67069 (2013.01 - KR US)
Citation (search report)
See references of WO 2012136199A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
DE 102011001785 A1 20121004; DE 102011001785 B4 20150305; CN 103649815 A 20140319; EP 2695015 A1 20140212; JP 2014514759 A 20140619; JP 5965986 B2 20160810; KR 20140027136 A 20140306; TW 201241577 A 20121016; TW I537686 B 20160611; US 2014118711 A1 20140501; US 9110380 B2 20150818; WO 2012136199 A1 20121011
DOCDB simple family (application)
DE 102011001785 A 20110404; CN 201280017466 A 20120308; DE 2012100056 W 20120308; EP 12722065 A 20120308; JP 2014502991 A 20120308; KR 20137026435 A 20120308; TW 101103203 A 20120201; US 201213820399 A 20120308