EP 2698356 A4 20141029 - ANTI-REFLECTION GLASS SUBSTRATE
Title (en)
ANTI-REFLECTION GLASS SUBSTRATE
Title (de)
REFLEXIONSHEMMENDES GLASSUBSTRAT
Title (fr)
SUBSTRAT DE VERRE ANTIREFLET
Publication
Application
Priority
- JP 2011091436 A 20110415
- JP 2011099983 A 20110427
- JP 2012060180 W 20120413
Abstract (en)
[origin: EP2698356A1] Provided is a glass substrate having excellent anti-reflection performance. A glass substrate of which at least one surface has multiple concave and convex portions, wherein the Rp representing the size of the convex portion is from 37 nm to 200 nm; a tilt angle ¸p indicating a maximum frequency in the frequency distribution of a tilt angle ¸ of the convex portion is from 20° to 75°; and in a case where ¸ 50 indicates a value showing 50% of a cumulative frequency distribution of the tilt angle ¸, an absolute value of a difference between ¸p and ¸ 50 (¸p - ¸ 50 ) is 30° or less, and the concave and convex portion is such that a surface roughness (Ra) thereof is from 2 nm to 100 nm, a maximum height difference (P-V) thereof is from 35 nm to 400 nm, and an area ratio (S-ratio) thereof, as calculated by dividing an area containing the concave and convex portion by an inspection area, is from 1.1 to 3.0.
IPC 8 full level
C03C 15/00 (2006.01); B60J 1/00 (2006.01); C03C 17/245 (2006.01); G02B 1/11 (2006.01); H01L 31/00 (2006.01)
CPC (source: EP US)
C03C 15/00 (2013.01 - EP US); C03C 17/23 (2013.01 - EP US); G02B 1/118 (2013.01 - EP US); H01L 31/02168 (2013.01 - US); C03C 2204/08 (2013.01 - EP US)
Citation (search report)
- [XI] US 4833001 A 19890523 - KIJIMA TAKASHI [JP], et al
- [XI] US 2010089096 A1 20100415 - TAMITSUJI CHIKAYA [JP], et al
- [A] US 2003170459 A1 20030911 - LIN JUEI-HUA [US]
- [XI] ILIESCU C ET AL: "Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, AMSTERDAM, NL, vol. 198, no. 1-3, 1 August 2005 (2005-08-01), pages 314 - 318, XP027608369, ISSN: 0257-8972, [retrieved on 20050801]
- See references of WO 2012141311A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
EP 2698356 A1 20140219; EP 2698356 A4 20141029; EP 2698356 B1 20180606; CN 103492336 A 20140101; CN 103492336 B 20150930; JP 5962652 B2 20160803; JP WO2012141311 A1 20140728; TW 201249767 A 20121216; TW I547455 B 20160901; US 2014246084 A1 20140904; US 9484473 B2 20161101; WO 2012141311 A1 20121018
DOCDB simple family (application)
EP 12770740 A 20120413; CN 201280018579 A 20120413; JP 2012060180 W 20120413; JP 2013509992 A 20120413; TW 101113399 A 20120413; US 201314054054 A 20131015