Global Patent Index - EP 2749670 A1

EP 2749670 A1 20140702 - Formaldehyde free electroless copper plating compositions and methods

Title (en)

Formaldehyde free electroless copper plating compositions and methods

Title (de)

Formaldehydfreie, stromlose Verkupferungszusammensetzungen und Verfahren

Title (fr)

Compositions et procédés de dépôt autocatalytique de cuivre exempt de formaldéhyde

Publication

EP 2749670 A1 20140702 (EN)

Application

EP 13199394 A 20131223

Priority

  • US 201261746112 P 20121226
  • US 201313769332 A 20130217

Abstract (en)

The copper electroless baths are formaldehyde free and are environmentally friendly. The electroless copper baths include one or more sulfinate compounds as reducing agents to replace formaldehyde. The electroless baths are stable and deposit a bright copper on substrates.

IPC 8 full level

C23C 18/40 (2006.01)

CPC (source: EP KR US)

C09D 1/00 (2013.01 - US); C23C 18/38 (2013.01 - KR); C23C 18/40 (2013.01 - EP KR US); H05K 3/187 (2013.01 - EP US); H01B 1/02 (2013.01 - EP US)

Citation (applicant)

Citation (search report)

Citation (examination)

  • US 5750018 A 19980512 - BRASCH WILLIAM R [US]
  • EP 1411147 A1 20040421 - SHIPLEY CO LLC [US]
  • TERSKAYA I.N ET AL: "Preparation of Stable Copper Dispersions by Redox Reactions of Cu(II) Salts with Sulfur-containing Reducing Agents and Properties of the Dispersions", RUSSIAN JOURNAL OF APPLIED CHEMISTRY, 1 June 2003 (2003-06-01), New York, pages 871 - 874, XP055662239, Retrieved from the Internet <URL:https://link.springer.com/content/pdf/10.1023/A:1026399204184.pdf> DOI: 10.1023/A:1026399204184

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

EP 2749670 A1 20140702; CN 103898489 A 20140702; CN 103898489 B 20160824; JP 2014129598 A 20140710; JP 6307266 B2 20180404; KR 20140083911 A 20140704; TW 201432090 A 20140816; TW I527931 B 20160401; US 2014178572 A1 20140626; US 2015376795 A1 20151231; US 9611550 B2 20170404; US 9809883 B2 20171107

DOCDB simple family (application)

EP 13199394 A 20131223; CN 201310757407 A 20131226; JP 2013265877 A 20131224; KR 20130164005 A 20131226; TW 102148129 A 20131225; US 201313769332 A 20130217; US 201514796459 A 20150710