Global Patent Index - EP 2768920 A4

EP 2768920 A4 20150603 - NON-AMINE POST-CMP COMPOSITION AND METHOD OF USE

Title (en)

NON-AMINE POST-CMP COMPOSITION AND METHOD OF USE

Title (de)

AMINFREIE POST-KMP-ZUSAMMENSETZUNG UND ANWENDUNGSVERFAHREN DAFÜR

Title (fr)

COMPOSITION APRÈS CMP SANS AMINES, AINSI QUE SON PROCÉDÉ D'UTILISATION

Publication

EP 2768920 A4 20150603 (EN)

Application

EP 11874382 A 20111021

Priority

US 2011057287 W 20111021

Abstract (en)

[origin: WO2013058770A1] A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of amine and ammonium-containing compounds, e.g., quaternary ammonium bases. The composition achieves highly efficacious cleaning of the post-CMP residue and contaminant material from the surface of the microelectronic device without compromising the low-k dielectric material or the copper interconnect material.

IPC 8 full level

H01L 21/02 (2006.01); C11D 3/04 (2006.01); C11D 3/43 (2006.01); C11D 7/06 (2006.01); C11D 7/50 (2006.01); C11D 3/20 (2006.01); C11D 3/34 (2006.01); C11D 7/26 (2006.01); C11D 7/34 (2006.01)

CPC (source: CN EP)

C11D 3/044 (2013.01 - CN EP); C11D 3/43 (2013.01 - CN EP); C11D 7/06 (2013.01 - CN EP); C11D 7/5009 (2013.01 - CN EP); C11D 7/5022 (2013.01 - CN EP); H01L 21/02057 (2013.01 - CN EP); H01L 21/02063 (2013.01 - CN EP); H01L 21/02074 (2013.01 - CN EP); C11D 3/2041 (2013.01 - CN EP); C11D 3/2065 (2013.01 - CN EP); C11D 3/2068 (2013.01 - CN EP); C11D 3/3454 (2013.01 - CN EP); C11D 7/261 (2013.01 - CN EP); C11D 7/263 (2013.01 - CN EP); C11D 7/34 (2013.01 - CN EP); C11D 2111/22 (2024.01 - CN EP)

Citation (search report)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

WO 2013058770 A1 20130425; CN 103958640 A 20140730; CN 103958640 B 20160518; CN 105869997 A 20160817; EP 2768920 A1 20140827; EP 2768920 A4 20150603; KR 101914817 B1 20181228; KR 20140082816 A 20140702

DOCDB simple family (application)

US 2011057287 W 20111021; CN 201180075099 A 20111021; CN 201610274374 A 20111021; EP 11874382 A 20111021; KR 20147013154 A 20111021