EP 2853350 A1 20150401 - POLISHING PAD AND METHOD FOR MANUFACTURING SAME
Title (en)
POLISHING PAD AND METHOD FOR MANUFACTURING SAME
Title (de)
POLIERKISSEN UND VERFAHREN ZUR HERSTELLUNG DAVON
Title (fr)
TAMPON À POLIR ET SON PROCÉDÉ DE FABRICATION
Publication
Application
Priority
- KR 20120054523 A 20120523
- KR 2013001085 W 20130212
Abstract (en)
Polishing pad and method of manufacturing the same, the method, whereby materials for forming a polishing layer are mixed and solidified by a chemical reaction so as to manufacture the polishing pad, the method including: grinding organic materials by using a physical method so as to form micro-organic particles; mixing the micro-organic particles formed in the operation with the materials for forming the polishing layer; mixing at least one selected from the group consisting of inert gas, a capsule type foaming agent, and a chemical foaming agent that are capable of controlling sizes of pores, with the mixture in the operation so as to form gaseous pores; performing gelling and hardening of the mixture generated in the operation so as to form a polishing layer; and processing the polishing layer so as to distribute open pores defined by opening gaseous pores on a surface of the polishing layer.
IPC 8 full level
B24D 11/00 (2006.01); B24D 3/16 (2006.01)
CPC (source: CN EP KR US)
B24B 37/24 (2013.01 - CN EP US); B24B 37/26 (2013.01 - CN EP US); B24D 3/16 (2013.01 - KR); B24D 11/00 (2013.01 - KR); B24D 11/001 (2013.01 - CN EP US); B24D 11/003 (2013.01 - CN EP US); B24D 18/00 (2013.01 - CN EP US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
EP 2853350 A1 20150401; EP 2853350 A4 20160113; CN 104507641 A 20150408; CN 104507641 B 20180105; JP 2015514598 A 20150521; JP 5959724 B2 20160802; KR 101417274 B1 20140709; KR 20130130893 A 20131203; SG 11201407257T A 20141230; US 2015133039 A1 20150514; WO 2013176378 A1 20131128
DOCDB simple family (application)
EP 13793745 A 20130212; CN 201380025329 A 20130212; JP 2015508847 A 20130212; KR 20120054523 A 20120523; KR 2013001085 W 20130212; SG 11201407257T A 20130212; US 201314397542 A 20130212