Global Patent Index - EP 2867916 A1

EP 2867916 A1 20150506 - APPARATUS FOR COATING A LAYER OF SPUTTERED MATERIAL ON A SUBSTRATE AND DEPOSITION SYSTEM

Title (en)

APPARATUS FOR COATING A LAYER OF SPUTTERED MATERIAL ON A SUBSTRATE AND DEPOSITION SYSTEM

Title (de)

VORRICHTUNG ZUR BESCHICHTUNG EINER SCHICHT AUS EINEM SPUTTERMATERIAL AUF EINEM SUBSTRAT UND AUFTRAGUNGSSYSTEM

Title (fr)

APPAREIL PERMETTANT DE DÉPOSER UNE COUCHE D'UN MATÉRIAU PULVÉRISÉ SUR UN SUBSTRAT, ET SYSTÈME DE DÉPÔT

Publication

EP 2867916 A1 20150506 (EN)

Application

EP 12730223 A 20120702

Priority

EP 2012062836 W 20120702

Abstract (en)

[origin: WO2014005617A1] An apparatus (10; 166; 224) for coating a layer of sputtered material on a substrate (12) is described. Said apparatus (10; 166; 224) comprises at least two magnet assemblies (60, 74, 82, 90, 98, 106), wherein each magnet assembly (60, 74, 82, 90, 98, 106) has an outer and an inner magnet polarity. The outer magnet polarity of one of the at least two magnet assemblies (60, 74, 82, 90, 98, 106) is different from an adjacent outer magnet polarity of the other one of the at least two magnet assemblies (60, 74, 82, 90, 98, 106). Further, a deposition system (14) is described which comprises such an apparatus (10; 166; 224).

IPC 8 full level

H01J 37/34 (2006.01); C23C 14/35 (2006.01)

CPC (source: CN EP KR)

C23C 14/352 (2013.01 - CN EP KR); H01J 37/3405 (2013.01 - CN EP KR); H01J 37/3417 (2013.01 - CN EP KR); H01J 37/345 (2013.01 - CN EP KR)

Citation (search report)

See references of WO 2014005617A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

WO 2014005617 A1 20140109; CN 104704603 A 20150610; CN 104704603 B 20170728; EP 2867916 A1 20150506; JP 2015522715 A 20150806; JP 6113841 B2 20170412; KR 101920840 B1 20181121; KR 20150037963 A 20150408; TW 201408804 A 20140301; TW I627297 B 20180621

DOCDB simple family (application)

EP 2012062836 W 20120702; CN 201280075041 A 20120702; EP 12730223 A 20120702; JP 2015518864 A 20120702; KR 20157002725 A 20120702; TW 102123028 A 20130627