EP 2875166 A4 20160601 - ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICATIONS
Title (en)
ORGANOSILANE PRECURSORS FOR ALD/CVD SILICON-CONTAINING FILM APPLICATIONS
Title (de)
ORGANOSILANVORLÄUFER FÜR ALD/CVD-SILICIUMHALTIGE FILMANWENDUNGEN
Title (fr)
PRÉCURSEURS D'ORGANOSILANE POUR DES APPLICATIONS FAISANT INTERVENIR DES FILMS CONTENANT DU SILICIUM DANS DES PROCÉDÉS ALD/CVD
Publication
Application
Priority
- US 201261674103 P 20120720
- US 2013051244 W 20130719
Abstract (en)
[origin: WO2014015232A1] Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
IPC 8 full level
C23C 16/24 (2006.01); C23C 16/448 (2006.01); C23C 16/455 (2006.01)
CPC (source: EP KR US)
B05D 1/60 (2013.01 - US); C07F 7/025 (2013.01 - EP US); C23C 16/24 (2013.01 - KR); C23C 16/30 (2013.01 - EP KR US); C23C 16/345 (2013.01 - EP KR US); C23C 16/36 (2013.01 - EP KR US); C23C 16/401 (2013.01 - EP KR US); C23C 16/402 (2013.01 - EP US); C23C 16/44 (2013.01 - US); C23C 16/448 (2013.01 - KR); C23C 16/45553 (2013.01 - EP US); H01L 21/02216 (2013.01 - US); H01L 21/02271 (2013.01 - US); H01L 21/0228 (2013.01 - US); H01L 21/02532 (2013.01 - US)
Citation (search report)
- [A] WO 2011103282 A2 20110825 - AIR LIQUIDE [FR], et al
- [A] US 2008081106 A1 20080403 - WANG ZIYUN [US], et al
- See references of WO 2014015232A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2014015232 A1 20140123; CN 104080944 A 20141001; CN 104080944 B 20160824; EP 2875166 A1 20150527; EP 2875166 A4 20160601; EP 2875166 B1 20180411; JP 2015525773 A 20150907; JP 2015525774 A 20150907; JP 2015528011 A 20150924; JP 6242026 B2 20171206; KR 20150034123 A 20150402; KR 20150036114 A 20150407; KR 20150036122 A 20150407; TW 201410689 A 20140316; TW 201410690 A 20140316; TW 201412762 A 20140401; TW 201412763 A 20140401; TW I579292 B 20170421; TW I586678 B 20170611; TW I620751 B 20180411; TW I631129 B 20180801; US 2015004317 A1 20150101; US 2015166576 A1 20150618; US 2015166577 A1 20150618; US 9371338 B2 20160621; US 9593133 B2 20170314; US 9938303 B2 20180410; WO 2014015237 A1 20140123; WO 2014015241 A1 20140123; WO 2014015248 A1 20140123
DOCDB simple family (application)
US 2013051244 W 20130719; CN 201380007437 A 20130719; EP 13819216 A 20130719; JP 2015523276 A 20130719; JP 2015523277 A 20130719; JP 2015523280 A 20130719; KR 20147023486 A 20130719; KR 20157001339 A 20130719; KR 20157001394 A 20130719; TW 102126076 A 20130722; TW 102126078 A 20130722; TW 102126082 A 20130722; TW 102126083 A 20130722; US 2013051249 W 20130719; US 2013051255 W 20130719; US 2013051264 W 20130719; US 201314372105 A 20130719; US 201314415647 A 20130719; US 201314415657 A 20130719