EP 2926361 A4 20160824 - SYSTEM AND METHOD FOR PLASMA GENERATION
Title (en)
SYSTEM AND METHOD FOR PLASMA GENERATION
Title (de)
SYSTEM UND VERFAHREN ZUR PLASMAERZEUGUNG
Title (fr)
SYSTÈME ET PROCÉDÉ DE GÉNÉRATION DE PLASMA
Publication
Application
Priority
US 2012052492 W 20120827
Abstract (en)
[origin: WO2014035365A1] A system and method for generating a plasma. An embodiment of the system for generating a plasma may include a first electrode; a second electrode disposed adjacent the first electrode; a first power supply for supplying power at the second electrode; a second power supply for generating a magnetic field; and a sequencer for coordinating a discharge of power from the first power supply and a discharge of power from the second power supply. The first power supply may be configured such that the discharge of power from the first power supply generates a plasma between the first electrode and the second electrode. The second power supply may be configured such that the magnetic field generated by the discharge of power from the second power supply rotates the plasma.
IPC 8 full level
F41H 13/00 (2006.01); H01J 7/24 (2006.01); H05H 1/50 (2006.01)
CPC (source: EP US)
F41H 5/007 (2013.01 - EP); H05H 1/46 (2013.01 - EP US); H05H 1/50 (2013.01 - EP); F41B 6/00 (2013.01 - EP); F42B 6/006 (2013.01 - EP); H05H 2242/26 (2021.05 - EP US)
Citation (search report)
- [XYI] US 3321919 A 19670530 - MAROLDA ANTHONY J
- [XI] US 2007120495 A1 20070531 - JUNG SOONHWA [KR], et al
- [Y] WO 2007008960 A1 20070118 - SCV QUALITY SOLUTION LLC [US], et al
- [A] US 3629553 A 19711221 - FEY MAURICE G, et al
- [A] EP 1746381 A1 20070124 - DEUTSCH ZENTR LUFT & RAUMFAHRT [DE]
- See references of WO 2014035365A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2014035365 A1 20140306; CA 2922635 A1 20140306; EP 2926361 A1 20151007; EP 2926361 A4 20160824; EP 2926361 B1 20180725
DOCDB simple family (application)
US 2012052492 W 20120827; CA 2922635 A 20120827; EP 12883678 A 20120827