EP 2926364 B1 20181226 - METAL DENSITY DISTRIBUTION FOR DOUBLE PATTERN LITHOGRAPHY
Title (en)
METAL DENSITY DISTRIBUTION FOR DOUBLE PATTERN LITHOGRAPHY
Title (de)
METALLDICHTEVERTEILUNG FÜR DOPPELMUSTERLITHOGRAFIE
Title (fr)
DISTRIBUTION DE DENSITÉ DE MÉTAL POUR UNE LITHOGRAPHIE À DOUBLE MOTIF
Publication
Application
Priority
- US 201213686184 A 20121127
- US 2013071614 W 20131125
Abstract (en)
[origin: US2014145342A1] Methods, a computer readable medium, and an apparatus are provided. A method includes and the computer readable medium is configured for decomposing an overall pattern into a first mask pattern that includes a power rail base pattern and into a second mask pattern, and generating on the second mask pattern a power rail insert pattern that is at least partially aligned with the power rail base pattern of the first mask pattern. The apparatus is produced by photolithography using photolithographic masks generated by the method.
IPC 8 full level
H01L 21/027 (2006.01)
CPC (source: CN EP US)
G03F 7/0035 (2013.01 - EP US); G03F 7/70466 (2013.01 - EP US); H01L 21/31144 (2013.01 - CN EP US); H01L 23/48 (2013.01 - US); H01L 2924/0002 (2013.01 - CN EP US)
C-Set (source: EP US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
US 10283437 B2 20190507; US 2014145342 A1 20140529; CN 104885193 A 20150902; CN 104885193 B 20181113; EP 2926364 A1 20151007; EP 2926364 A4 20160803; EP 2926364 B1 20181226; JP 2016505878 A 20160225; JP 6325568 B2 20180516; KR 102211660 B1 20210203; KR 20150088805 A 20150803; WO 2014085299 A1 20140605
DOCDB simple family (application)
US 201213686184 A 20121127; CN 201380061885 A 20131125; EP 13859012 A 20131125; JP 2015544167 A 20131125; KR 20157014043 A 20131125; US 2013071614 W 20131125