EP 2940178 A1 20151104 - METHOD FOR PREPARING AL2O2 COATING ON SURFACE OF SILICON -NITRIDE -CUTTING TOOL BY USING PVD,AND COMPOSITE COATING METHOD
Title (en)
METHOD FOR PREPARING AL2O2 COATING ON SURFACE OF SILICON -NITRIDE -CUTTING TOOL BY USING PVD,AND COMPOSITE COATING METHOD
Title (de)
VERFAHREN ZUR HERSTELLUNG EINER AL2O2-BESCHICHTUNG AUF EINER OBERFLÄCHE EINES SILICIUM-NITRID-SCHNEIDWERKZEUGS MITTELS PVD UND VERBUNDSTOFFBESCHICHTUNGSVERFAHREN
Title (fr)
PROCÉDÉ DE FORMATION D'UN REVETEMENT À BASE DE AL2O2 LA SURFACE D'UN OUTIL DE COUPE EN NITRURE DE SILICIUM PAR PVD ET PROCÉDÉ DE REVETEMENT FAISANT APPEL À UN MATÉRIAU COMPOSITE
Publication
Application
Priority
- US 201261745871 P 20121226
- CN 2013084753 W 20130930
Abstract (en)
A method for preparing an aluminum-oxide single-layer coating or multi-layer coating on the surface of silicon-nitride ceamic cutting tool by using a Physical Vapor Depositon (PVD) process. There are two methods for preparing the aluminum-oxdie coating by using the PVD techonology: one is depositing an aluminum-oxide layer through reactive sputtering of Al target by using a bipolar pulse power source and a Dual Magnetron Sputtering (DMS) technology in the O 2 atmosphere or Ar-O 2 mixed atmosphere; the other one is sputtering, by using DMS technology in the Ar atmosphere or Ar-O 2 mixed atmosphere, an aluminum-oxide ceramic target conductive doping, and then preparing the aluminum-oxide coating. With the two methods, a single-layer aluminum-oxide coating, a nitride and aluminum-oxide composite coating, or a multi-layer or nano composite coating obtained by alternately depositing nitride and alumimum oxide is prepared, the aluminum-oxide being ±-Al 2 O 3 , ²-Al 2 O 3 , ³-Al 2 O 3 , or amorphous Al 2 O 3 . The hard nitride coating in the multi-layer composite aluminum-oxide coating comprises a two-element nitride coating, a three-element nitride coating, multi-element nitride coating, or a multi-layer composite thereof of a nano coating.
IPC 8 full level
C23C 28/04 (2006.01); C04B 35/584 (2006.01); C23C 14/08 (2006.01); C23C 28/00 (2006.01)
CPC (source: CN EP US)
C04B 35/584 (2013.01 - EP US); C04B 35/587 (2013.01 - EP US); C04B 35/593 (2013.01 - EP US); C04B 41/009 (2013.01 - EP US); C04B 41/5031 (2013.01 - EP US); C04B 41/52 (2013.01 - EP US); C04B 41/87 (2013.01 - EP US); C04B 41/89 (2013.01 - EP US); C23C 14/081 (2013.01 - EP US); C23C 28/04 (2013.01 - EP US); C23C 28/042 (2013.01 - EP US); C23C 28/044 (2013.01 - CN EP US); C23C 28/42 (2013.01 - EP US); C04B 2235/3225 (2013.01 - EP US); C04B 2235/3886 (2013.01 - EP US); Y10T 428/24975 (2015.01 - EP US); Y10T 428/265 (2015.01 - EP US)
C-Set (source: EP US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
US 2014178659 A1 20140626; US 9290847 B2 20160322; CN 104302804 A 20150121; CN 104302804 B 20161026; EP 2940178 A1 20151104; EP 2940178 A4 20160817; WO 2014101517 A1 20140703
DOCDB simple family (application)
US 201314138427 A 20131223; CN 2013084753 W 20130930; CN 201380001583 A 20130930; EP 13867666 A 20130930