Global Patent Index - EP 2965349 A2

EP 2965349 A2 20160113 - METHOD AND APPARATUS FOR PLASMA DICING A SEMI-CONDUCTOR WAFER

Title (en)

METHOD AND APPARATUS FOR PLASMA DICING A SEMI-CONDUCTOR WAFER

Title (de)

VERFAHREN UND VORRICHTUNG FÜR PLASMA-SCHNEIDEN EINES HALBLEITERWAFERS

Title (fr)

PROCÉDÉ ET APPAREIL DE DÉCOUPAGE DE PUCE PAR PLASMA D'UNE TRANCHE DE SEMI-CONDUCTEUR

Publication

EP 2965349 A2 20160113 (EN)

Application

EP 14712447 A 20140303

Priority

  • US 201313787032 A 20130306
  • US 2014019914 W 20140303

Abstract (en)

[origin: WO2014137905A2] The present invention provides a method for plasma dicing a substrate. The method comprising providing a process chamber having a wall; providing a plasma source adjacent to the wall of the process chamber; providing a work piece support within the process chamber; placing the substrate onto a support film on a frame to form a work piece work piece; loading the work piece onto the work piece support; providing a clamping electrode for electrostatically clamping the work piece to the work piece support; providing a mechanical partition between the plasma source and the work piece; generating a plasma through the plasma source; and etching the work piece through the generated plasma.

IPC 8 full level

H01L 21/683 (2006.01); H01L 21/78 (2006.01)

CPC (source: EP)

H01J 37/32082 (2013.01); H01L 21/67069 (2013.01); H01L 21/67092 (2013.01); H01L 21/6831 (2013.01); H01L 21/6875 (2013.01); H01L 21/78 (2013.01)

Citation (search report)

See references of WO 2014137905A2

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

WO 2014137905 A2 20140912; WO 2014137905 A3 20150226; CN 105190862 A 20151223; CN 105190862 B 20180911; EP 2965349 A2 20160113; EP 3594998 A1 20200115; EP 3594998 B1 20220105; JP 2016517624 A 20160616; JP 6388886 B2 20180912; TW 201438104 A 20141001; TW 201637094 A 20161016; TW I579915 B 20170421; TW I584371 B 20170521

DOCDB simple family (application)

US 2014019914 W 20140303; CN 201480012801 A 20140303; EP 14712447 A 20140303; EP 19194081 A 20140303; JP 2015561503 A 20140303; TW 103107189 A 20140304; TW 105120752 A 20140304