EP 2984677 A1 20160217 - METHOD FOR MASKING A SURFACE COMPRISING SILICON OXIDE
Title (en)
METHOD FOR MASKING A SURFACE COMPRISING SILICON OXIDE
Title (de)
VERFAHREN ZUM MASKIEREN EINER SILIZIUMOXID HALTIGEN OBERFLÄCHE
Title (fr)
PROCÉDÉ POUR MASQUER UNE SURFACE CONTENANT DE L'OXYDE DE SILICIUM
Publication
Application
Priority
- DE 102013206527 A 20130412
- EP 2014055361 W 20140318
Abstract (en)
[origin: WO2014166706A1] The invention relates to a method for masking a surface, in particular a surface having silicon oxide, aluminum or silicon, having the method steps: a) providing a substrate having a surface to be masked, in particular having a surface having silicon oxide, aluminum or silicon; and b) producing a defined masking pattern by locally selective forming of colloidal silicon oxide on the surface. The method according to the invention allows for the creating of an extremely stable masking in a simple and cost-effective manner, in contrast to a plurality of etching media, in particular in contrast to hydrofluoric acid, in order to thus create extremely accurate and defined structures such as by an etching process. The invention further relates to an electronic component and to the use of colloidal silicon oxide for locally selective masking of a surface to be treated.
IPC 8 full level
H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/3213 (2006.01)
CPC (source: EP US)
H01L 21/02164 (2013.01 - US); H01L 21/0332 (2013.01 - EP US); H01L 21/0337 (2013.01 - US); H01L 21/3081 (2013.01 - EP US); H01L 21/31111 (2013.01 - US); H01L 21/32139 (2013.01 - EP US)
Citation (search report)
See references of WO 2014166706A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
DE 102013206527 A1 20141016; CN 105074871 A 20151118; CN 105074871 B 20190212; EP 2984677 A1 20160217; US 10490403 B2 20191126; US 2016035570 A1 20160204; WO 2014166706 A1 20141016
DOCDB simple family (application)
DE 102013206527 A 20130412; CN 201480020436 A 20140318; EP 14710885 A 20140318; EP 2014055361 W 20140318; US 201414783464 A 20140318