EP 2990425 A4 20161207 - NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
Title (en)
NOVEL ALICYCLIC ESTER COMPOUND, AND (METH)ACRYLIC COPOLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME
Title (de)
NEUARTIGE ALICYCLISCHE ESTERVERBINDUNG SOWIE (METH)ACRYLCOPOLYMER UND LICHTEMPFINDLICHE HARZZUSAMMENSETZUNG DAMIT
Title (fr)
NOUVEAU COMPOSE D'ESTER ALICYCLIQUE ET COPOLYMERE (METH)ACRYLIQUE ET COMPOSITION DE RESINE PHOTOSENSIBLE LES CONTENANT
Publication
Application
Priority
- JP 2013090080 A 20130423
- JP 2014026210 A 20140214
- JP 2014061316 W 20140422
Abstract (en)
[origin: EP2990425A1] [Problem to be solved] The present invention provides, as a chemically amplified resist, a well-balanced resist or compound which results in improved sensitivity, resolution and line edge roughness (LER) without impairing the fundamental physical properties required as a resist (e.g., pattern shape, dry etching resistance, heat resistance). [Means to solve the problem] A mixture of cycloaliphatic ester compounds represented by general formulae (1) to (3), and a process for preparation thereof, as well as a (meth)acrylic copolymer comprising the cycloaliphatic ester compounds of general formulae (1) to (3) and a photosensitive resin composition thereof.
IPC 8 full level
C08F 220/28 (2006.01); C07B 61/00 (2006.01); C07C 67/26 (2006.01); C07C 69/757 (2006.01); G03F 7/039 (2006.01)
CPC (source: EP US)
C07C 67/26 (2013.01 - EP US); C07C 69/757 (2013.01 - EP US); C08F 220/283 (2020.02 - EP US); C08L 33/14 (2013.01 - EP US); G03F 7/039 (2013.01 - US); G03F 7/0397 (2013.01 - EP US); C07C 2603/74 (2017.04 - EP US); C08F 220/285 (2020.02 - US)
Citation (search report)
- [A] WO 2012008546 A1 20120119 - JSR CORP [JP], et al
- See references of WO 2014175275A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
EP 2990425 A1 20160302; EP 2990425 A4 20161207; EP 2990425 B1 20180530; CN 105143291 A 20151209; CN 105143291 B 20170322; JP 6274205 B2 20180207; JP WO2014175275 A1 20170223; KR 20160003628 A 20160111; TW 201509902 A 20150316; TW I614235 B 20180211; US 2016070168 A1 20160310; US 9477151 B2 20161025; WO 2014175275 A1 20141030
DOCDB simple family (application)
EP 14788121 A 20140422; CN 201480022671 A 20140422; JP 2014061316 W 20140422; JP 2015513772 A 20140422; KR 20157022304 A 20140422; TW 103114684 A 20140423; US 201414786114 A 20140422