EP 3007858 A4 20170308 - LOW SURFACE ROUGHNESS POLISHING PAD
Title (en)
LOW SURFACE ROUGHNESS POLISHING PAD
Title (de)
POLIERKISSEN MIT GERINGER OBERFLÄCHENRAUHIGKEIT
Title (fr)
TAMPON DE POLISSAGE À FAIBLE RUGOSITÉ DE SURFACE
Publication
Application
Priority
- US 201313917422 A 20130613
- US 2014040226 W 20140530
Abstract (en)
[origin: US2014370788A1] The invention provides a polishing pad comprising a polishing pad body comprising a polishing surface, wherein the polishing body comprises pores, and wherein the polishing surface has a surface roughness of about 0.1 μm to about 10 μm.
IPC 8 full level
B24B 37/20 (2012.01); B24B 37/26 (2012.01)
CPC (source: EP US)
B24B 37/205 (2013.01 - EP US); B24B 37/26 (2013.01 - EP US)
Citation (search report)
- [XI] US 2009075568 A1 20090319 - KIMURA TSUYOSHI [JP], et al
- [XI] WO 0191972 A1 20011206 - RODEL INC [US]
- [A] WO 2012068428 A2 20120524 - CABOT MICROELECTRONICS CORP [US], et al
- See references of WO 2014200726A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
US 2014370788 A1 20141218; CN 105163907 A 20151216; CN 105163907 B 20171128; EP 3007858 A1 20160420; EP 3007858 A4 20170308; JP 2016524549 A 20160818; KR 20160019465 A 20160219; SG 11201508452V A 20151230; TW 201501865 A 20150116; TW I542442 B 20160721; WO 2014200726 A1 20141218
DOCDB simple family (application)
US 201313917422 A 20130613; CN 201480024087 A 20140530; EP 14811299 A 20140530; JP 2016519532 A 20140530; KR 20157036537 A 20140530; SG 11201508452V A 20140530; TW 103119535 A 20140605; US 2014040226 W 20140530