EP 3007900 A4 20170510 - LOW-PARTICLE GAS ENCLOSURE SYSTEMS AND METHODS
Title (en)
LOW-PARTICLE GAS ENCLOSURE SYSTEMS AND METHODS
Title (de)
GEHÄUSESYSTEME UND -VERFAHREN FÜR PARTIKELARMES GAS
Title (fr)
SYSTÈMES ET PROCÉDÉS D'ENCEINTE À GAZ À FAIBLE TAUX DE PARTICULES
Publication
Application
Priority
- US 201361833398 P 20130610
- US 201361911934 P 20131204
- US 201461925578 P 20140109
- US 201414205340 A 20140311
- US 201461983417 P 20140423
- US 2014037722 W 20140512
Abstract (en)
[origin: WO2014200642A1] The present teachings relate to various embodiments of a gas enclosure system that can have various components comprising a particle control system that can provide a low-particle zone proximal to a substrate. Various components of a particle control system can include a gas circulation and filtration system, a low-particle-generating motion system for moving a printhead assembly relative to a substrate, a service bundle housing exhaust system, and a printhead assembly exhaust system. In addition to maintaining substantially low levels for each species of various reactive species, including various reactive atmospheric gases, such as water vapor and oxygen, for various embodiments of a gas enclosure system that have a particle control system, an on-substrate particle specification can be readily met. Accordingly, processing of various substrates in an inert, low-particle gas environment according to systems and methods of the present teachings can have substantially lower manufacturing defects.
IPC 8 full level
B41J 2/01 (2006.01); B05D 3/06 (2006.01); B41J 29/12 (2006.01); B41J 29/13 (2006.01); B41J 29/377 (2006.01); F24F 3/16 (2006.01); H10K 99/00 (2023.01)
CPC (source: EP KR)
B41J 2/01 (2013.01 - KR); B41J 2/175 (2013.01 - EP); B41J 2/17509 (2013.01 - EP); B41J 3/407 (2013.01 - KR); B41J 29/02 (2013.01 - EP); B41J 29/12 (2013.01 - EP KR); B41J 29/13 (2013.01 - EP KR); B41J 29/377 (2013.01 - EP KR); H10K 71/135 (2023.02 - EP KR); H10K 71/15 (2023.02 - KR); H10K 71/811 (2023.02 - KR)
Citation (search report)
- [X] US 2013040061 A1 20130214 - LOWRANCE ROBERT [US], et al
- [X] US 2013004656 A1 20130103 - CHEN JIANGLONG [US], et al
- [X] US 2010201749 A1 20100812 - SOMEKH SASS [US], et al
- [X] US 2004086631 A1 20040506 - HAN YU-KAI [TW], et al
- [E] EP 2973676 A2 20160120 - KATEEVA INC [US]
- See also references of WO 2014200642A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
WO 2014200642 A1 20141218; CN 105431294 A 20160323; CN 105431294 B 20180424; CN 108162606 A 20180615; CN 108162606 B 20200331; CN 110816072 A 20200221; CN 110816072 B 20210903; EP 3007900 A1 20160420; EP 3007900 A4 20170510; JP 2016529649 A 20160923; JP 2018206777 A 20181227; JP 2020123574 A 20200813; JP 2022058335 A 20220412; JP 2023138525 A 20231002; JP 6378327 B2 20180822; JP 6871203 B2 20210512; JP 6986770 B2 20211222; JP 7351543 B2 20230927; KR 101946694 B1 20190211; KR 102161419 B1 20200929; KR 102342098 B1 20211221; KR 20160019485 A 20160219; KR 20190014589 A 20190212; KR 20200053634 A 20200518; KR 20200111834 A 20200929; KR 20210156864 A 20211227; KR 20230065385 A 20230511
DOCDB simple family (application)
US 2014037722 W 20140512; CN 201480045349 A 20140512; CN 201810257998 A 20140512; CN 201911241814 A 20140512; EP 14810543 A 20140512; JP 2016519508 A 20140512; JP 2018140175 A 20180726; JP 2020056162 A 20200326; JP 2021189072 A 20211122; JP 2023115599 A 20230714; KR 20167000033 A 20140512; KR 20197003113 A 20140512; KR 20207013077 A 20140512; KR 20207027237 A 20140512; KR 20217041315 A 20140512; KR 20237015024 A 20140512