EP 3011807 A1 20160427 - DEVICE AND METHOD FOR HANDLING PROCESS GASES IN A PLASMA STIMULATED BY HIGH FREQUENCY ELECTROMAGNETIC WAVES
Title (en)
DEVICE AND METHOD FOR HANDLING PROCESS GASES IN A PLASMA STIMULATED BY HIGH FREQUENCY ELECTROMAGNETIC WAVES
Title (de)
VORRICHTUNG UND VERFAHREN ZUR BEHANDLUNG VON PROZESSGASEN IN EINEM PLASMA ANGEREGT DURCH ELEKTROMAGNETISCHE WELLEN HOHER FREQUENZ
Title (fr)
DISPOSITIF ET PROCÉDÉ POUR TRAITER DES GAZ DE TRAITEMENT DANS UN PLASMA EXCITÉ PAR DES ONDES ÉLECTROMAGNÉTIQUES À HAUTE FRÉQUENCE
Publication
Application
Priority
- DE 102013215252 A 20130802
- EP 2014066277 W 20140729
Abstract (en)
[origin: WO2015014839A1] The invention relates to a device for handling process gases in a plasma stimulated by electromagnetic waves, comprising a plasma chamber, which is lined by a dielectric, a generator for generating the electromagnetic waves and a waveguide assembly for feeding the electromagnetic waves into the plasma chamber, wherein the waveguide assembly has at least two feed points, each having an electric field waveguide branch, for feeding the electromagnetic waves as continuous waves into the dielectric.
IPC 8 full level
H05H 1/46 (2006.01)
CPC (source: EP)
H05H 1/46 (2013.01); H05H 1/461 (2021.05); H05H 1/4622 (2021.05)
Citation (search report)
See references of WO 2015014839A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2015014839 A1 20150205; DE 102013215252 A1 20150205; EP 3011807 A1 20160427; EP 3011807 B1 20171115
DOCDB simple family (application)
EP 2014066277 W 20140729; DE 102013215252 A 20130802; EP 14744363 A 20140729