EP 3055442 A1 20160817 - METAL OXIDE TARGET AND METHOD FOR PRODUCING SAME
Title (en)
METAL OXIDE TARGET AND METHOD FOR PRODUCING SAME
Title (de)
METALLOXID-TARGET UND VERFAHREN ZU SEINER HERSTELLUNG
Title (fr)
CIBLE EN OXYDE MÉTALLIQUE ET SON PROCÉDÉ DE FABRICATION
Publication
Application
Priority
- DE 102013016529 A 20131007
- EP 2014071355 W 20141006
Abstract (en)
[origin: WO2015052139A1] The invention relates to a sputtering target for producing layers, in particular optical layers. The invention additionally relates to a layer, in particular an optical layer, and a device for producing a sputtering target. The invention further relates to a method for producing a sputtering target. According to the invention the sputtering target additionally has, for example, at least one metal oxide, at least one combination consisting of at least two metal oxides, or a combination of at least one metal oxide in the form of an alloy or in the form of a mixture such that a sputtering target is produced with metal oxide components using the elements Si and Al or the alloy thereof and using the at least one metal oxide or the combination thereof. The metal oxide in the sputtering target is preferably a metal oxide from the group consisting of ZrO2, Ta2O5, Y2O3, HfO, CaO, MgO, Ce2O3, Al2O3, TiO2, or Nb2O5.
IPC 8 full level
C23C 14/34 (2006.01); C23C 4/06 (2006.01); C23C 4/12 (2006.01)
CPC (source: EP US)
C23C 4/06 (2013.01 - US); C23C 4/11 (2016.01 - EP US); C23C 4/134 (2016.01 - EP US); C23C 14/08 (2013.01 - US); C23C 14/081 (2013.01 - US); C23C 14/082 (2013.01 - US); C23C 14/083 (2013.01 - US); C23C 14/14 (2013.01 - US); C23C 14/3414 (2013.01 - EP US); G02B 1/12 (2013.01 - US); H01J 37/3426 (2013.01 - EP US); H01J 37/3429 (2013.01 - EP US)
Citation (search report)
See references of WO 2015052139A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
DE 102013016529 A1 20150409; CN 105593400 A 20160518; CN 105593400 B 20180420; EP 3055442 A1 20160817; JP 2016539246 A 20161215; US 10475630 B2 20191112; US 2016260590 A1 20160908; WO 2015052139 A1 20150416
DOCDB simple family (application)
DE 102013016529 A 20131007; CN 201480055081 A 20141006; EP 14781517 A 20141006; EP 2014071355 W 20141006; JP 2016520613 A 20141006; US 201415027488 A 20141006