EP 3068452 A1 20160921 - IMPLANT HAVING AN INCREASED NEGATIVE SURFACE CHARGE
Title (en)
IMPLANT HAVING AN INCREASED NEGATIVE SURFACE CHARGE
Title (de)
IMPLANTAT MIT ERHÖHTER NEGATIVER OBERFLÄCHENLADUNG
Title (fr)
IMPLANT À CHARGE SUPERFICIELLE NÉGATIVE ÉLEVÉE
Publication
Application
Priority
- CH 19032013 A 20131114
- EP 2014074390 W 20141112
Abstract (en)
[origin: WO2015071322A1] The invention relates to an implant for implantation into a body. The implant comprises a surface that is provided for contact with the body or a body fluid when implanted and which surface has a first surface charge when in a first state. The surface assumes a second state having a second surface charge as a result of surface treatment, the second surface charge having a lower positive surface charge or a higher negative surface charge than the first surface charge. The implant is used for regulating an adsorption of proteins on the surface of the implant in terms of type, quantity and/or conformation of certain proteins by means of a defined second state of the surface, which has a defined second surface charge and/or a defined predetermined composition of an oxide layer of the surface.
IPC 8 full level
A61L 31/02 (2006.01); A61L 31/14 (2006.01)
CPC (source: EP US)
A61L 27/025 (2013.01 - US); A61L 27/04 (2013.01 - EP US); A61L 27/047 (2013.01 - US); A61L 27/50 (2013.01 - EP US); A61L 31/022 (2013.01 - EP US); A61L 31/14 (2013.01 - EP US); A61L 2400/18 (2013.01 - EP US)
Citation (search report)
See references of WO 2015071322A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
CH 708833 A1 20150515; EP 3068452 A1 20160921; US 2016256598 A1 20160908; WO 2015071322 A1 20150521
DOCDB simple family (application)
CH 19032013 A 20131114; EP 14801977 A 20141112; EP 2014074390 W 20141112; US 201415037008 A 20141112