Global Patent Index - EP 3150744 B1

EP 3150744 B1 20200212 - ELECTROPLATING BATH FOR ELECTROCHEMICAL DEPOSITION OF A CU-SN-ZN-PD ALLOY LAYER, METHOD FOR ELECTROCHEMICAL DEPOSITION OF SAID ALLOY LAYER, SUBSTRATE COMPRISING SAID ALLOY LAYER AND USES OF THE COATED SUBSTRATE

Title (en)

ELECTROPLATING BATH FOR ELECTROCHEMICAL DEPOSITION OF A CU-SN-ZN-PD ALLOY LAYER, METHOD FOR ELECTROCHEMICAL DEPOSITION OF SAID ALLOY LAYER, SUBSTRATE COMPRISING SAID ALLOY LAYER AND USES OF THE COATED SUBSTRATE

Title (de)

GALVANIKBAD ZUR ELEKTROCHEMISCHEN ABSCHEIDUNG EINER CU-SN-ZN-PD LEGIERUNGSSCHICHT, VERFAHREN ZUR ELEKTROCHEMISCHEN ABSCHEIDUNG DER LEGIERUNGSSCHICHT, SUBSTRAT MIT DER LEGIERUNGSSCHICHT UND VERWENDUNGEN DES BESCHICHTETEN SUBSTRATS

Title (fr)

BAIN GALVANIQUE POUR LE DÉPÔT ÉLECTROCHIMIQUE D'UNE COUCHE D'ALLIAGE CU-SN-ZN-PD, PROCÉDÉ DE DÉPÔT ÉLECTROCHIMIQUE DE CETTE COUCHE D'ALLIAGE, SUBSTRAT COMPRENANT CETTE COUCHE D'ALLIAGE ET UTILISATIONS DU SUBSTRAT REVÊTU

Publication

EP 3150744 B1 20200212 (EN)

Application

EP 15187511 A 20150930

Priority

EP 15187511 A 20150930

Abstract (en)

[origin: EP3150744A1] The invention provides an electroplating bath for electrochemical deposition of a novel Cu-Sn-Zn-Pd alloy on a substrate. The novel alloy is characterized by exceptional corrosion resistance and the commonly used precious metal intermediate layer (e.g. a Pd-layer) between the substrate and the finishing layer is no longer necessary which allows a substantial reduction of the production costs of the plated substrates.

IPC 8 full level

C22C 9/02 (2006.01)

CPC (source: EP US)

C22C 9/02 (2013.01 - EP); C25D 3/58 (2013.01 - EP US); C25D 3/60 (2013.01 - EP); C25D 5/10 (2013.01 - EP US); C25D 5/611 (2020.08 - EP US); C25D 5/627 (2020.08 - EP US); C25D 7/005 (2013.01 - EP)

Citation (examination)

Citation (opposition)

Opponent : BLUCLAD S.p.A.

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

EP 3150744 A1 20170405; EP 3150744 B1 20200212; CN 108138346 A 20180608; CN 108138346 B 20210305; EP 3356579 A1 20180808; EP 3356579 B1 20200311; ES 2790583 T3 20201028; ES 2791197 T3 20201103; PT 3150744 T 20200512; PT 3356579 T 20200616; WO 2017055553 A1 20170406

DOCDB simple family (application)

EP 15187511 A 20150930; CN 201680056531 A 20160930; EP 16778284 A 20160930; EP 2016073427 W 20160930; ES 15187511 T 20150930; ES 16778284 T 20160930; PT 15187511 T 20150930; PT 16778284 T 20160930