Global Patent Index - EP 3174907 A1

EP 3174907 A1 20170607 - FORMULATION FOR AN INSULATION SYSTEM AND INSULATION SYSTEM

Title (en)

FORMULATION FOR AN INSULATION SYSTEM AND INSULATION SYSTEM

Title (de)

FORMULIERUNG FÜR EIN ISOLIERSYSTEM UND ISOLIERSYSTEM

Title (fr)

FORMULATION POUR UN SYSTÈME ISOLANT ET SYSTÈME ISOLANT

Publication

EP 3174907 A1 20170607 (DE)

Application

EP 15774537 A 20150922

Priority

  • DE 102014219765 A 20140930
  • EP 2015071691 W 20150922

Abstract (en)

[origin: WO2016050557A1] The invention relates to a novel formulation for an insulation system that has a higher erosion resistance and that can be used in the form of a casting or compression-molding resin as insulation for conductors and/or insulation for the walls of current-carrying conductors in generators, motors and/or rotary machines. The formulation comprises isotropic and spheric nanofiller particles in a weight percentage of up to 25% having organic and inorganic portions.

IPC 8 full level

C08C 19/25 (2006.01); H01B 3/00 (2006.01); H01B 3/40 (2006.01); H01B 3/46 (2006.01)

CPC (source: CN EP US)

C08L 63/00 (2013.01 - US); H01B 3/002 (2013.01 - CN EP US); H01B 3/006 (2013.01 - CN EP US); H01B 3/28 (2013.01 - EP US); H01B 3/40 (2013.01 - CN EP US); H01B 3/441 (2013.01 - CN EP US); H01B 3/46 (2013.01 - CN EP US); C08C 19/25 (2013.01 - EP US)

Citation (search report)

See references of WO 2016050557A1

Citation (examination)

ALAN. J. WADDON ET AL: "Crystal Structure of Polyhedral Oligomeric Silsequioxane (POSS) Nano-materials: A Study by X-ray Diffraction and Electron Microscopy", CHEMISTRY OF MATERIALS, vol. 15, no. 24, 1 December 2003 (2003-12-01), pages 4555 - 4561, XP055468238, ISSN: 0897-4756, DOI: 10.1021/cm034308b

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

DE 102014219765 A1 20160331; CN 107077916 A 20170818; EP 3174907 A1 20170607; JP 2017531710 A 20171026; US 2017301429 A1 20171019; WO 2016050557 A1 20160407

DOCDB simple family (application)

DE 102014219765 A 20140930; CN 201580052838 A 20150922; EP 15774537 A 20150922; EP 2015071691 W 20150922; JP 2017517303 A 20150922; US 201515515770 A 20150922