EP 3196699 A4 20180516 - PELLICLE, PRODUCTION METHOD THEREOF, EXPOSURE METHOD
Title (en)
PELLICLE, PRODUCTION METHOD THEREOF, EXPOSURE METHOD
Title (de)
PELLIKEL, HERSTELLUNGSVERFAHREN DAFÜR, BELICHTUNGSVERFAHREN
Title (fr)
PELLICULE, PROCÉDÉ DE FABRICATION DE CETTE PELLICULE ET PROCÉDÉ D'EXPOSITION
Publication
Application
Priority
- JP 2014191930 A 20140919
- JP 2014233128 A 20141117
- JP 2015076568 W 20150917
Abstract (en)
[origin: US2017184956A1] Provided are a pellicle for extreme ultraviolet light lithography, a production method thereof, and an exposure method. A pellicle according to the present invention includes a first frame having a pellicle film located thereon; a second frame including a thick portion including a first surface carrying a surface of the first frame opposite to a surface on which the pellicle film is located, and also including a second surface connected with the first surface and carrying a side surface of the first frame, the second frame enclosing the pellicle film and the first frame; a through-hole provided in the thick portion of the second frame; and a filter located on an outer side surface of the second frame and covering the through-hole, the outer side surface crossing the surface of the first frame on which the pellicle film is located.
IPC 8 full level
G03F 1/64 (2012.01); H01L 21/027 (2006.01)
CPC (source: EP KR US)
G03F 1/62 (2013.01 - US); G03F 1/64 (2013.01 - EP KR US); G03F 1/66 (2013.01 - KR); G03F 1/68 (2013.01 - US); G03F 7/2008 (2013.01 - US); G03F 7/70958 (2013.01 - KR); H01L 21/027 (2013.01 - EP KR US)
Citation (search report)
- [A] US 2009029268 A1 20090129 - LIN BURN JENG [TW], et al
- [A] US 2010323281 A1 20101223 - SEKIHARA KAZUTOSHI [JP]
- [A] US 2003095245 A1 20030522 - MISHIRO HITOSHI [JP], et al
- [A] WO 02057852 A1 20020725 - PHOTRONICS INC [US]
- See also references of WO 2016043292A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
US 10488751 B2 20191126; US 2017184956 A1 20170629; CN 106662806 A 20170510; CN 106662806 B 20211105; CN 113917783 A 20220111; CN 113917783 B 20231219; EP 3196699 A1 20170726; EP 3196699 A4 20180516; JP 6275270 B2 20180207; JP WO2016043292 A1 20170629; KR 101915912 B1 20181106; KR 20170038907 A 20170407; SG 11201701805Q A 20170427; TW 201612622 A 20160401; TW I693467 B 20200511; WO 2016043292 A1 20160324
DOCDB simple family (application)
US 201715454555 A 20170309; CN 201580046947 A 20150917; CN 202111214914 A 20150917; EP 15841815 A 20150917; JP 2015076568 W 20150917; JP 2016548957 A 20150917; KR 20177005999 A 20150917; SG 11201701805Q A 20150917; TW 104130889 A 20150918