Global Patent Index - EP 3205741 B1

EP 3205741 B1 20230405 - CONTINUOUS HOT-DIP METAL PLATING METHOD AND CONTINUOUS HOT-DIP METAL PLATING EQUIPMENT

Title (en)

CONTINUOUS HOT-DIP METAL PLATING METHOD AND CONTINUOUS HOT-DIP METAL PLATING EQUIPMENT

Title (de)

KONTINUIERLICHES SCHMELZTAUCHVERFAHREN UND AUSRÜSTUNG FÜR KONTINUIERLICHES SCHMELZTAUCHVERFAHREN

Title (fr)

PROCÉDÉ DE MÉTALLISATION PAR IMMERSION À CHAUD EN CONTINU ET MATÉRIEL DE MÉTALLISATION PAR IMMERSION À CHAUD EN CONTINU

Publication

EP 3205741 B1 20230405 (EN)

Application

EP 15848228 A 20150916

Priority

  • JP 2014206882 A 20141008
  • JP 2015004715 W 20150916

Abstract (en)

[origin: EP3205741A1] To provide a continuous hot-dip metal coating method that uses a gas wiping nozzle to control the coating weight and prevents occurrence of coating surface defects so that high-quality hot-dip metal-coated steel strips can be stably manufactured at a low cost. A galvanized steel strip and a continuous hot-dip metal coating facility are also provided. A continuous hot-dip metal coating method includes continuously immersing a steel strip into a molten metal bath and blowing gas from a gas wiping nozzle onto the steel strip immediately after the steel strip is withdrawn from the molten metal bath so as to control a coating weight, in which a temperature T of wiping gas to be injected from the gas wiping nozzle is controlled on a basis of a D/B value, which is a ratio of a distance D between a tip of the gas wiping nozzle and the steel strip to a gap B of the gas wiping nozzle.

IPC 8 full level

C22C 18/04 (2006.01); C23C 2/06 (2006.01); C23C 2/20 (2006.01)

CPC (source: EP KR)

C22C 18/04 (2013.01 - EP KR); C23C 2/06 (2013.01 - EP KR); C23C 2/20 (2013.01 - EP KR); C23C 2/40 (2013.01 - KR); C23C 2/52 (2022.08 - KR)

Citation (examination)

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

DOCDB simple family (publication)

EP 3205741 A1 20170816; EP 3205741 A4 20170830; EP 3205741 B1 20230405; CN 106795614 A 20170531; CN 106795614 B 20191101; JP 6011740 B2 20161019; JP WO2016056178 A1 20170427; KR 101910756 B1 20181022; KR 20170048549 A 20170508; MX 2017004585 A 20170627; TW 201619411 A 20160601; TW I561675 B 20161211; WO 2016056178 A1 20160414

DOCDB simple family (application)

EP 15848228 A 20150916; CN 201580054270 A 20150916; JP 2015004715 W 20150916; JP 2016501923 A 20150916; KR 20177009127 A 20150916; MX 2017004585 A 20150916; TW 104132752 A 20151006