EP 3210238 A1 20170830 - COBALT POLISHING ACCELERATORS
Title (en)
COBALT POLISHING ACCELERATORS
Title (de)
KOBALTPOLIERUNGSBESCHLEUNIGER
Title (fr)
ACCÉLÉRATEURS DE POLISSAGE DE COBALT
Publication
Application
Priority
- US 201462066484 P 20141021
- US 201562197992 P 20150728
- US 2015056749 W 20151021
Abstract (en)
[origin: WO2016065060A1] The invention provides a chemical mechanical polishing composition comprising (a) abrasive particles, (b) a cobalt accelerator selected from a compound having the formula: NR1R2R3 wherein R1, R2, and R3 are independently selected from hydrogen, carboxyalkyl, substituted carboxyalkyl, hydroxyalkyl, substituted hydroxyalkyl and aminocarbonylalkyl, wherein none or one of R1, R<u> 2 </u>, and R3 are hydrogen; dicarboxyheterocycles; heterocyclylalkyl-α- amino acids; N (amidoalkyl)amino acids; unsubstituted heterocycles; alkyl substituted heterocycles; substituted-alkyl substituted heterocycles; N aminoalkyl -α- amino acids; and combinations thereof, (c) a cobalt corrosion inhibitor, (d) an oxidizing agent that oxidizes a metal, and (e) water, wherein the polishing composition has a pH of about 3 to about 8.5. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical mechanical polishing composition. Typically, the substrate contains cobalt.
IPC 8 full level
H01L 21/304 (2006.01)
CPC (source: CN EP US)
B24B 37/044 (2013.01 - CN EP US); C09G 1/02 (2013.01 - CN US); C23F 3/04 (2013.01 - CN EP US); H01L 21/3212 (2013.01 - CN EP US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2016065060 A1 20160428; CN 107148457 A 20170908; CN 107148457 B 20190709; EP 3210238 A1 20170830; EP 3210238 A4 20180418; EP 3210238 B1 20190626; JP 2017538285 A 20171221; JP 6646051 B2 20200214; KR 102538575 B1 20230601; KR 20170076719 A 20170704; TW 201634652 A 20161001; TW I580767 B 20170501; US 2016115353 A1 20160428; US 2017260421 A1 20170914; US 9688885 B2 20170627; US 9850403 B2 20171226
DOCDB simple family (application)
US 2015056749 W 20151021; CN 201580057492 A 20151021; EP 15852684 A 20151021; JP 2017519258 A 20151021; KR 20177013245 A 20151021; TW 104134568 A 20151021; US 201514919449 A 20151021; US 201715603634 A 20170524