EP 3227024 A1 20171011 - DISPERSION AND ACCUMULATION OF MAGNETIC PARTICLES IN A MICROFLUIDIC SYSTEM
Title (en)
DISPERSION AND ACCUMULATION OF MAGNETIC PARTICLES IN A MICROFLUIDIC SYSTEM
Title (de)
DISPERSION UND AKKUMULATION VON MAGNETISCHEN PARTIKELN IN EINEM MIKROFLUIDISCHEN SYSTEM
Title (fr)
DISPERSION ET ACCUMULATION DE PARTICULES MAGNÉTIQUES DANS UN SYSTÈME MICROFLUIDIQUE
Publication
Application
Priority
- EP 14195888 A 20141202
- US 201562102757 P 20150113
- EP 2015078118 W 20151201
Abstract (en)
[origin: WO2016087397A1] The invention relates to a microfluidic system comprising a magnetic source (150) and two chambers (110) that are connected by a channel. According to a preferred embodiment, the chambers and the channel are filled with different fluids such that a non-zero surface tension is created at the associated fluidic interfaces. Moreover, the magnetic source (150) is arranged to provide at least two separate magnetic gradient regions (GR) and to allow for the attraction of magnetic particles (MP) present in one of the chambers into these different regions, wherein furthermore the magnetic attraction forces (F) generated by at least one of the gradient regions (GR) is strong enough to allow for pushing or pulling magnetic particles through said fluidic interfaces. In a preferred embodiment, the magnetic source may be realized by a permanent magnet (150) of hexahedral shape. The invention further relates to a method for achieving dispersion and a method for achieving accumulation of an ensemble of magnetic particles in said microfluidic system.
IPC 8 full level
B01L 3/00 (2006.01)
CPC (source: CN EP RU US)
B01L 3/502715 (2013.01 - US); B01L 3/50273 (2013.01 - CN EP US); B01L 3/502761 (2013.01 - CN EP US); B01L 3/502784 (2013.01 - CN EP US); B01L 3/50273 (2013.01 - RU); B01L 3/502761 (2013.01 - RU); B01L 3/502784 (2013.01 - RU); B01L 2200/027 (2013.01 - US); B01L 2200/0647 (2013.01 - CN EP US); B01L 2200/0673 (2013.01 - CN EP US); B01L 2300/0864 (2013.01 - US); B01L 2400/043 (2013.01 - CN EP US)
Citation (examination)
- WO 2004078316 A1 20040916 - ECOLE POLYTECH [CH], et al
- WO 2011098089 A1 20110818 - UNIV DANMARKS TEKNISKE [DK], et al
- US 2013134041 A1 20130530 - TAMURA AKITAKE [JP]
- US 2014120570 A1 20140501 - YU LIPING [US], et al
- WO 2011042828 A1 20110414 - KONINKL PHILIPS ELECTRONICS NV [NL], et al
- See also references of WO 2016087397A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2016087397 A1 20160609; BR 112017004584 A2 20180123; CN 106660044 A 20170510; CN 106660044 B 20190423; EP 3227024 A1 20171011; JP 2017523907 A 20170824; JP 6353155 B2 20180704; MX 2017002359 A 20170517; RU 2632460 C1 20171004; US 2017259264 A1 20170914; US 9931632 B2 20180403
DOCDB simple family (application)
EP 2015078118 W 20151201; BR 112017004584 A 20151201; CN 201580048292 A 20151201; EP 15802101 A 20151201; JP 2017502999 A 20151201; MX 2017002359 A 20151201; RU 2017108151 A 20151201; US 201515322554 A 20151201