EP 3289113 A1 20180307 - METHOD FOR PRODUCING COATED SUBSTRATES
Title (en)
METHOD FOR PRODUCING COATED SUBSTRATES
Title (de)
VERFAHREN ZUR HERSTELLUNG VON BESCHICHTETEN SUBSTRATEN
Title (fr)
PROCÉDÉ DE FABRICATION DE SUBSTRATS REVÊTUS
Publication
Application
Priority
- DE 102015104977 A 20150331
- EP 2016057065 W 20160331
Abstract (en)
[origin: WO2016156496A1] The invention relates to a method for producing substrates having a plasma coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device, comprising moving a substrate relative to the plasma device by means of a movement device along a curve, and depositing coating material on a surface of the substrate in a coating region along a trajectory lying on the surface of the substrate using the plasma device. Also provided is: a) the determining of actual values of a layer thickness of deposited coating material on at least parts of the trajectory in the movement direction of the substrate; b) the comparing of the actual values with target values of the layer thickness on the at least parts of the trajectory; c) the determining of parameters of the plasma device to change the amount of coating material deposited per time unit i accordance with the position of the substrate, in such a way that the actual values of the layer thickness of deposited coating material deviate by less than a predetermined difference from the target values; d) the setting of parameters of the plasma device to change the amount of coating material deposited per time unit according to point c); and e) depositing coating material by means of the plasma device, using the parameters set in point d). The invention further relates to a device for producing substrates (10, 100) having a plasma-coated surface made of a dielectric coating material in a vacuum chamber, having an AC-powered plasma device (31, 32, 150, 180), comprising a movement device for moving a substrate (10, 100) relative to the plasma device (31, 32, 150, 180) along a curve, wherein by means of the plasma device (31, 32, 150, 180) coating material is deposited on a surface (11, 101) of the substrate (10, 100) in a coating region along a trajectory lying on the surface of the substrate (12, 105), comprising a control module (140) which is designed and configured to carry out the method.
IPC 8 full level
C23C 14/00 (2006.01); C23C 14/54 (2006.01)
CPC (source: EP US)
C23C 14/0078 (2013.01 - EP US); C23C 14/547 (2013.01 - EP US); H01J 37/18 (2013.01 - US); H01J 37/32036 (2013.01 - EP US); H01J 37/32119 (2013.01 - EP US); H01J 37/32155 (2013.01 - EP US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2016156496 A1 20161006; CN 107532290 A 20180102; CN 107532290 B 20220401; EP 3289113 A1 20180307; JP 2018511705 A 20180426; JP 6707559 B2 20200610; TW 201702408 A 20170116; TW I624552 B 20180521; US 11814718 B2 20231114; US 2018087142 A1 20180329
DOCDB simple family (application)
EP 2016057065 W 20160331; CN 201680024331 A 20160331; EP 16714365 A 20160331; JP 2017551229 A 20160331; TW 105110515 A 20160331; US 201615563129 A 20160331