EP 3298181 A1 20180328 - METHOD FOR APPLYING AN OVERGROWTH LAYER ONTO A SEED LAYER
Title (en)
METHOD FOR APPLYING AN OVERGROWTH LAYER ONTO A SEED LAYER
Title (de)
VERFAHREN ZUR AUFBRINGUNG EINER ÜBERWUCHSSCHICHT AUF EINE KEIMSCHICHT
Title (fr)
PROCÉDÉ POUR APPLIQUER UNE COUCHE DE SURCROISSANCE SUR UNE COUCHE GERME
Publication
Application
Priority
EP 2015061251 W 20150521
Abstract (en)
[origin: WO2016184523A1] The invention relates to a method for applying a masked overgrowth layer (14) onto a seed layer (2) for the production of semiconductor components, characterized in that a mask (6) for masking the overgrowth layer (14) is embossed on the seed layer (2).
IPC 8 full level
C23C 14/04 (2006.01); C23C 16/04 (2006.01); C30B 23/04 (2006.01); C30B 25/04 (2006.01); G03F 7/00 (2006.01); H01L 21/027 (2006.01)
CPC (source: EP US)
C30B 23/04 (2013.01 - EP US); C30B 25/04 (2013.01 - EP US); G03F 7/0002 (2013.01 - EP US); H01L 21/02381 (2013.01 - EP US); H01L 21/0242 (2013.01 - EP US); H01L 21/02433 (2013.01 - EP US); H01L 21/02439 (2013.01 - EP US); H01L 21/02521 (2013.01 - EP US); H01L 21/02642 (2013.01 - EP US); H01L 21/02647 (2013.01 - EP US)
Citation (search report)
See references of WO 2016184523A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2016184523 A1 20161124; CN 108368640 A 20180803; EP 3298181 A1 20180328; JP 2018523287 A 20180816; JP 6799007 B2 20201209; US 10241398 B2 20190326; US 2018120695 A1 20180503
DOCDB simple family (application)
EP 2015061251 W 20150521; CN 201580079657 A 20150521; EP 15724285 A 20150521; JP 2017556206 A 20150521; US 201515565437 A 20150521