EP 3311396 A1 20180425 - SELF-CENTERING WAFER CARRIER SYSTEM FOR CHEMICAL VAPOR DEPOSITION
Title (en)
SELF-CENTERING WAFER CARRIER SYSTEM FOR CHEMICAL VAPOR DEPOSITION
Title (de)
SELBSTZENTRIERENDES WAFERTRÄGERSYSTEM ZUR CHEMISCHEN DAMPFABSCHEIDUNG
Title (fr)
SYSTÈME DE SUPPORT DE TRANCHES À AUTO-CENTRAGE À DES FINS DE DÉPÔT CHIMIQUE EN PHASE VAPEUR
Publication
Application
Priority
- US 201562183166 P 20150622
- US 201562241482 P 20151014
- US 201662298540 P 20160223
- US 2016037022 W 20160610
Abstract (en)
[origin: WO2016209647A1] A self-centering wafer carrier system for a chemical vapor deposition (CVD) reactor includes a wafer carrier comprising an edge. The wafer carrier at least partially supports a wafer for CVD processing. A rotating tube comprises an edge that supports the wafer carrier during processing. An edge geometry of the wafer carrier and an edge geometry of the rotating tube being chosen to provide a coincident alignment of a central axis of the wafer carrier and a rotation axis of the rotating tube during process at a desired process temperature.
IPC 8 full level
H01L 21/02 (2006.01); H01L 21/205 (2006.01); H01L 21/677 (2006.01); H01L 21/68 (2006.01)
CPC (source: EP)
C23C 16/4584 (2013.01); C23C 16/4585 (2013.01); H01L 21/68735 (2013.01); H01L 21/68785 (2013.01); H01L 21/68792 (2013.01)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2016209647 A1 20161229; EP 3311396 A1 20180425; EP 3311396 A4 20190220; JP 2018522401 A 20180809; SG 11201708235W A 20171129
DOCDB simple family (application)
US 2016037022 W 20160610; EP 16815048 A 20160610; JP 2017560537 A 20160610; SG 11201708235W A 20160610