EP 3323022 A1 20180523 - MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Title (en)
MIRROR, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
Title (de)
SPIEGEL, INSBESONDERE FÜR EINE MIKROLITHOGRAPHISCHE PROJEKTIONSBELICHTUNGSANLAGE
Title (fr)
MIROIR NOTAMMENT DESTINÉ À UNE INSTALLATION DE LITHOGRAPHIE PAR PROJECTION MICROLITHOGRAPHIQUE
Publication
Application
Priority
- DE 102015213253 A 20150715
- EP 2016066178 W 20160707
Abstract (en)
[origin: WO2017009185A1] The invention relates to a mirror, in particular for a microlithographic projection exposure apparatus, wherein the mirror has an optical effective area, having a mirror substrate (205, 305), a reflection layer (220, 320), which is designed such that the mirror has a reflectivity of at least 50% for electromagnetic radiation of a specified operating wavelength, which impinges on the optical effective area (200a, 300a) at an angle of incidence of at least 65° relative to the respective surface normal, and a substrate protection layer (210, 310), which is arranged between the mirror substrate (205, 305) and the reflection layer (220, 320), wherein the substrate protection layer (210, 310) has a transmission of less than 0.1% for EUV radiation.
IPC 8 full level
G03F 7/20 (2006.01)
CPC (source: EP US)
G03F 7/7015 (2013.01 - US); G03F 7/702 (2013.01 - US); G03F 7/70316 (2013.01 - EP US); G03F 7/70958 (2013.01 - EP US); G03F 7/70983 (2013.01 - US); G21K 1/062 (2013.01 - EP)
Citation (search report)
See references of WO 2017009185A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
Designated extension state (EPC)
BA ME
DOCDB simple family (publication)
WO 2017009185 A1 20170119; DE 102015213253 A1 20170119; EP 3323022 A1 20180523; JP 2018522281 A 20180809; JP 6814195 B2 20210113; US 10331048 B2 20190625; US 2018217507 A1 20180802
DOCDB simple family (application)
EP 2016066178 W 20160707; DE 102015213253 A 20150715; EP 16741264 A 20160707; JP 2018501301 A 20160707; US 201815871926 A 20180115