EP 3355116 B1 20200930 - EXPOSURE METHOD
Title (en)
EXPOSURE METHOD
Title (de)
BELICHTUNGSVERFAHREN
Title (fr)
PROCÉDÉ D'EXPOSITION
Publication
Application
Priority
- CN 201510622624 A 20150925
- CN 2016075914 W 20160309
Abstract (en)
[origin: EP3355116A1] The present disclosure provides a mask plate, an exposure device and an exposure method. The mask plate includes a base plate and a plurality of patterns with openings arranged on the base plate. The base plate includes a first region corresponding to a position where a developing agent has a low concentration in the case that a target substrate is to be developed, and a second region corresponding to a position where the developing agent has a high concentration in the case that the target substrate is to be developed. In the case that the target substrate is exposed using the mask plate, an amount of light beams passing through each pattern at the first region of the base plate is greater than an amount of the light beams passing through each pattern at the second region of the base plate, to compensate for a critical dimension at a position corresponding to the second region through the excessive light beams at the first region, thereby to enable an evenness value of the critical dimension to be greater than a predetermined value. The exposure device incudes the mask plate, and the exposure method includes exposing the target substrate through the exposure device.
IPC 8 full level
G03F 7/20 (2006.01); G02B 5/20 (2006.01); G03F 1/38 (2012.01); G03F 1/50 (2012.01); G03F 7/30 (2006.01)
CPC (source: EP US)
G02B 5/20 (2013.01 - EP US); G03F 1/38 (2013.01 - EP US); G03F 1/50 (2013.01 - EP US); G03F 7/0007 (2013.01 - US); G03F 7/20 (2013.01 - EP US); G03F 7/30 (2013.01 - EP US); G03F 7/70191 (2013.01 - US); G02F 1/1303 (2013.01 - US)
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
EP 3355116 A1 20180801; EP 3355116 A4 20190515; EP 3355116 B1 20200930; CN 105116694 A 20151202; CN 105116694 B 20171222; US 10114283 B2 20181030; US 2018203343 A1 20180719; WO 2017049883 A1 20170330
DOCDB simple family (application)
EP 16782175 A 20160309; CN 201510622624 A 20150925; CN 2016075914 W 20160309; US 201615309008 A 20160309