Global Patent Index - EP 3387668 A1

EP 3387668 A1 20181017 - III-NITRIDE STRUCTURES GROWN SILICON SUBSTRATES WITH INCREASED COMPRESSIVE STRESS

Title (en)

III-NITRIDE STRUCTURES GROWN SILICON SUBSTRATES WITH INCREASED COMPRESSIVE STRESS

Title (de)

AUF SILIXIUMSUBSTRATEN GEZÜCHTETE III-NITRID-STRUKTUREN MIT ERHÖHTER DRUCKEIGENSPANNUNG

Title (fr)

SUBSTRATS EN SILICIUM OBTENUS PAR CROISSANCE AVEC STRUCTURES AU NITRURE III PRÉSENTANT UNE CONTRAINTE DE COMPRESSION ACCRUE

Publication

EP 3387668 A1 20181017 (EN)

Application

EP 16822298 A 20161205

Priority

  • US 201562265927 P 20151210
  • US 2016065019 W 20161205

IPC 8 full level

H01L 21/02 (2006.01)

CPC (source: EP US)

H01L 21/02381 (2013.01 - EP); H01L 21/02458 (2013.01 - EP); H01L 21/0254 (2013.01 - EP); H01L 21/0257 (2013.01 - EP); H01L 21/0262 (2013.01 - EP); H01L 29/2003 (2013.01 - US); H01L 29/207 (2013.01 - US); H01L 29/36 (2013.01 - US); H01L 29/66431 (2013.01 - US); H01L 29/7787 (2013.01 - US)

Citation (search report)

See references of WO 2017100141A1

Designated contracting state (EPC)

AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR

Designated extension state (EPC)

BA ME

DOCDB simple family (publication)

EP 3387668 A1 20181017

DOCDB simple family (application)

EP 16822298 A 20161205