EP 3464674 A4 20200129 - HIGH-PRECISION SHADOW-MASK-DEPOSITION SYSTEM AND METHOD THEREFOR
Title (en)
HIGH-PRECISION SHADOW-MASK-DEPOSITION SYSTEM AND METHOD THEREFOR
Title (de)
HOCHPRÄZISES SCHATTENMASKENABSCHEIDUNGSSYSTEM UND VERFAHREN DAFÜR
Title (fr)
SYSTÈME DE DÉPÔT HAUTE PRÉCISION PAR MASQUE PERFORÉ ET PROCÉDÉ ASSOCIÉ
Publication
Application
Priority
- US 201662340793 P 20160524
- US 2017033161 W 20170517
Abstract (en)
[origin: CN109642313A] A direct-deposition system capable of forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through an aperture pattern of a shadowmask to deposit on the substrate in the desired pattern. Prior to reaching the shadow mask, the vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. As a result, the vaporized atoms that pass through the shadow mask exhibit little or no lateral spread (i.e., feathering) after passing through its apertures and the material deposits on the substrate in a pattern that has very high fidelity with the aperture pattern of the shadow mask. The present invention, therefore, mitigates the need for relatively large space between regions of deposited material normally required in the prior art, thereby enabling high-resolution patterning.
IPC 8 full level
C23C 14/04 (2006.01); C23C 14/24 (2006.01); C23C 14/50 (2006.01); C23C 14/58 (2006.01); G03F 9/00 (2006.01); H01L 21/68 (2006.01); H01L 21/683 (2006.01); H10K 99/00 (2023.01)
CPC (source: EP US)
C23C 14/042 (2013.01 - EP US); C23C 14/24 (2013.01 - EP US); H10K 71/00 (2023.02 - US); H10K 71/166 (2023.02 - EP US)
Citation (search report)
- [XYI] US 2004115338 A1 20040617 - YONEDA KIYOSHI [JP]
- [Y] JP H07150347 A 19950613 - NEC CORP, et al
- [Y] JP H0741943 A 19950210 - NEC CORP
- [Y] US 2007024831 A1 20070201 - HIBBS MICHAEL S [US], et al
- See also references of WO 2017205147A1
Designated contracting state (EPC)
AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR
DOCDB simple family (publication)
CN 109642313 A 20190416; CN 109642313 B 20210309; EP 3464674 A1 20190410; EP 3464674 A4 20200129
DOCDB simple family (application)
CN 201780040228 A 20170517; EP 17803308 A 20170517